SCHEMBL7541817

SCHEMBL7541817

O=S(=O)(c1ccccc1)C1CCC1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 5/20 0.56
KCNH2 Q12809 4/20 0.53
HTR2C P28335 3/20 0.53
MMP13 P45452 4/20 0.53
MMP8 P22894 3/20 0.53
MMP1 P03956 2/20 0.53
MAPT P10636 2/20 0.52
ALDH1A1 P00352 2/20 0.51
ACHE P22303 1/20 0.48
KDM4E B2RXH2 1/20 0.47
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
MMP2 P08253 1/20 0.44
MMP9 P14780 1/20 0.44
MMP14 P50281 1/20 0.44
HTR6 P50406 1/20 0.44
AKR1C3 P42330 2/20 0.43
DRD2 P14416 1/20 0.42
GAA P10253 1/20 0.42
MCOLN3 Q8TDD5 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL777971 0.95 MAPT (0.56) HTR2AKCNH2HTR2CMMP13MMP8
SCHEMBL776895 0.93 MAPT (0.55) HTR2AKCNH2HTR2CMMP13MMP8
SCHEMBL2048495 0.91 HTR2A (0.59) HTR2AKCNH2HTR2CMMP13MMP8
SCHEMBL10797246 0.83 HTR2A (0.46) HTR2AKCNH2HTR2CMMP13MMP8
SCHEMBL21615770 0.83 HTR2A (0.46) HTR2AKCNH2HTR2CMMP13MMP8
SCHEMBL777163 0.83 MMP13 (0.51) HTR2AKCNH2HTR2CMMP13MMP8
SCHEMBL25432674 0.82 ALDH1A1 (0.47) HTR2AKCNH2HTR2CMMP13MMP8
SCHEMBL11120903 0.81 HTR2A (0.51) HTR2AKCNH2HTR2CMAPTALDH1A1
SCHEMBL16863988 0.81 HTR2A (0.56) HTR2AKCNH2HTR2CMAPTALDH1A1
SCHEMBL776544 0.81 HTR2A (0.51) HTR2AKCNH2HTR2CMMP13MMP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111699206-B Polymers comprising photoacid generators 株式会社LG化学 2022-05-10 CN disclosed
CN-113994256-A Method for forming EUV patterned resist 亚历克斯·P·G·罗宾逊 2022-01-28 CN disclosed
CN-111699206-A Polymers comprising photoacid generators 株式会社LG化学 2020-09-22 CN disclosed
CN-110998437-A Multi-trigger photoresist compositions and methods A·P·G·罗宾森 2020-04-10 CN disclosed
CN-107406392-A Composition of matter and molecular resists made therefrom 亚历克斯·菲利普·格雷厄姆·罗宾逊 2017-11-28 CN disclosed
CN-104884423-B methanofullerene 亚历克斯·菲利普·格雷厄姆·罗宾逊 2017-11-17 CN disclosed
CN-107087426-A two-step photoresist composition and method 亚历克斯·菲利普·格雷厄姆·罗宾逊 2017-08-22 CN disclosed
US-9505859-B2 Process for producing polydienes BRIDGESTONE CORPORATION (JP) 2016-11-29 US disclosed
EP-2780381-B1 PROCESS FOR PRODUCING POLYDIENES BRIDGESTONE CORP (JP) 2015-10-07 EP disclosed
US-20140303327-A1 Process For Producing Polydienes BRIDGESTONE CORPORATION (JP) 2014-10-09 US disclosed
EP-2780381-A1 PROCESS FOR PRODUCING POLYDIENES Bridgestone Corporation (JP) 2014-09-24 EP disclosed
WO-2013075085-A1 PROCESS FOR PRODUCING POLYDIENES BRIDGESTONE CORPORATION (JP) 2013-05-23 WO disclosed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed