Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.56 |
| ▸ | HTR2A | P28223 | 5/20 | 0.56 |
| ▸ | KCNH2 | Q12809 | 4/20 | 0.53 |
| ▸ | HTR2C | P28335 | 3/20 | 0.53 |
| ▸ | MMP8 | P22894 | 2/20 | 0.49 |
| ▸ | MMP13 | P45452 | 2/20 | 0.49 |
| ▸ | MMP1 | P03956 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | ACHE | P22303 | 1/20 | 0.44 |
| ▸ | HTR6 | P50406 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | DRD2 | P14416 | 2/20 | 0.43 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL776895 | 0.98 | MAPT (0.55) | MAPTHTR2AKCNH2HTR2CMMP8 | |
| SCHEMBL7541817 | 0.95 | HTR2A (0.56) | MAPTHTR2AKCNH2HTR2CMMP8 | |
| SCHEMBL2048495 | 0.91 | HTR2A (0.59) | MAPTHTR2AKCNH2HTR2CMMP8 | |
| SCHEMBL21615770 | 0.87 | HTR2A (0.46) | MAPTHTR2AKCNH2HTR2CMMP8 | |
| SCHEMBL25432674 | 0.86 | ALDH1A1 (0.47) | MAPTHTR2AKCNH2HTR2CMMP8 | |
| SCHEMBL21795337 | 0.83 | MMP8 (0.44) | MAPTHTR2AKCNH2HTR2CMMP8 | |
| SCHEMBL10797246 | 0.83 | HTR2A (0.46) | MAPTHTR2AKCNH2HTR2CMMP8 | |
| SCHEMBL21615541 | 0.82 | MMP8 (0.43) | MAPTHTR2AKCNH2HTR2CMMP8 | |
| SCHEMBL10799767 | 0.82 | MAPT (0.45) | MAPTHTR2AKCNH2HTR2CMMP8 | |
| SCHEMBL702657 | 0.82 | MMP8 (0.69) | MAPTHTR2AKCNH2HTR2CMMP8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12100809-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-09-24 | — | — | US | disclosed |
| CN-116710783-A | Detection of target analytes by cross-spray ESI mass spectrometry | 豪夫迈·罗氏有限公司 | 2023-09-05 | — | — | CN | disclosed |
| US-20220149436-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-05-12 | — | — | US | disclosed |
| CN-111699206-B | Polymers comprising photoacid generators | 株式会社LG化学 | 2022-05-10 | — | — | CN | disclosed |
| US-11283107-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-03-22 | — | — | US | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| CN-111699206-A | Polymers comprising photoacid generators | 株式会社LG化学 | 2020-09-22 | — | — | CN | disclosed |
| CN-110998437-A | Multi-trigger photoresist compositions and methods | A·P·G·罗宾森 | 2020-04-10 | — | — | CN | disclosed |
| EP-3621141-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2020-03-11 | — | — | EP | disclosed |
| US-20190229372-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-07-25 | — | — | US | disclosed |
| WO-2013075085-A1 | PROCESS FOR PRODUCING POLYDIENES | BRIDGESTONE CORPORATION (JP) | 2013-05-23 | — | — | WO | disclosed |
| CN-101313246-B | Radiation-sensitive resin composition | JSR CORP | 2012-10-03 | — | — | CN | disclosed |
| US-20120177988-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20120070731-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20090325065-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2009-12-31 | — | — | US | disclosed |
| EP-2012386-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | Mitsubishi Chemical Corporation (JP) | 2009-01-07 | — | — | EP | disclosed |
| CN-101313246-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2008-11-26 | — | — | CN | disclosed |
| EP-0819981-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2002-06-05 | — | — | EP | disclosed |
| US-5952150-A | COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS | JSR CORPORATION (JP) | 1999-09-14 | — | — | US | disclosed |
| US-3949001-A | Process for producing aryl alpha-haloalkyl sulfones | SOUTHERN ILLINOIS UNIVERSITY FOUNDATION (US) | 1976-04-06 | — | — | US | disclosed |