(Z)-1,2-Diphenylethene

(Z)-1,2-Diphenylethene

SCHEMBL7565813

C(=Cc1ccccc1)c1ccccc1.CC(C)(C)OC(=O)O

nearest known ligand 0.55

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.55
EGFR P00533 1/20 0.49
GLA P06280 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
ALDH1A1 P00352 3/20 0.47
HDAC1 Q13547 3/20 0.47
MAPT P10636 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
LMNA P02545 2/20 0.47
HDAC3 O15379 2/20 0.47
HDAC4 P56524 2/20 0.47
HDAC2 Q92769 2/20 0.47
HDAC8 Q9BY41 2/20 0.47
HDAC6 Q9UBN7 2/20 0.47
TNKS O95271 1/20 0.47
HCAR2 Q8TDS4 1/20 0.47
HDAC7 Q8WUI4 1/20 0.47
HDAC10 Q969S8 1/20 0.47
HDAC11 Q96DB2 1/20 0.47
TNKS2 Q9H2K2 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL28236128 0.86 ALDH1A1 (0.54) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL14967314 0.82 HDAC1 (0.51) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL14967548 0.82 HDAC1 (0.51) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL9805467 0.82 HDAC1 (0.51) CYP2C19EGFRGLATDP1ALDH1A1
Naphthalene SCHEMBL16005359 0.81 ALDH1A1 (0.44) CYP2C19TDP1ALDH1A1MAPTNFKB1
SCHEMBL126771 0.81 GLA (0.55) CYP2C19EGFRGLATDP1ALDH1A1
SCHEMBL1006098 0.81 GLA (0.55) CYP2C19EGFRGLATDP1ALDH1A1
Benzene SCHEMBL1003607 0.80 DGAT1 (0.40) CYP2C19TDP1ALDH1A1NFKB1NFKB2
Phenol SCHEMBL7725643 0.79 TDP1 (0.48) CYP2C19GLATDP1ALDH1A1MAPT
SCHEMBL104809 0.78 CYP2C19 (0.45) CYP2C19EGFRGLATDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US disclosed