Phenol

Phenol

SCHEMBL7725643

CC(C)(C)OC(=O)O.Oc1ccccc1

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.48
CA12 O43570 2/20 0.48
CA1 P00915 2/20 0.48
CA14 Q9ULX7 2/20 0.48
CA2 P00918 1/20 0.48
GLA P06280 1/20 0.48
CA3 P07451 1/20 0.48
CA4 P22748 1/20 0.48
CA9 Q16790 1/20 0.48
ESR1 P03372 3/20 0.43
ESR2 Q92731 2/20 0.43
ALDH1A1 P00352 2/20 0.43
CYP3A4 P08684 2/20 0.43
KMT2A Q03164 2/20 0.42
MEN1 O00255 1/20 0.42
NPC1 O15118 1/20 0.42
GAA P10253 1/20 0.42
RAB9A P51151 1/20 0.42
TSHR P16473 1/20 0.42
HSD17B10 Q99714 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Naphthalene SCHEMBL16005359 0.84 ALDH1A1 (0.44) TDP1CA12CA1CA14ALDH1A1
Benzene SCHEMBL1003607 0.83 DGAT1 (0.40) TDP1CA12CA1CA14ALDH1A1
Phenol SCHEMBL6931537 0.83 THRB (0.40) TDP1CA12CA1CA14CA2
(Z)-1,2-Diphenylethene SCHEMBL7565813 0.79 CYP2C19 (0.55) TDP1GLAALDH1A1CYP3A4KMT2A
Acetophenone SCHEMBL28515261 0.79 SMN1; SMN2 (0.50) TDP1ALDH1A1KMT2AMEN1NPC1
4-Vinylphenol SCHEMBL28570873 0.79 MIF (0.50) TDP1CA12CA1CA14CA2
SCHEMBL74329 0.78
SCHEMBL21436131 0.78 DGAT1 (0.43) TDP1CA1CA2ALDH1A1KMT2A
Phenol SCHEMBL25374179 0.77 CA12 (0.58) TDP1CA12CA1CA14CA2
Phenol SCHEMBL18603299 0.77 CA12 (0.58) TDP1CA12CA1CA14CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6403280-B1 TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY JSR CORPORATION (JP) 2002-06-11 US disclosed
EP-1048983-A1 Radiation sensitive resin composition JSR Corporation (JP) 2000-11-02 EP disclosed
US-5688628-A ACID FORMER, POLYMERS, PHENOLIC COMPOUND NIPPON ZEON CO., LTD. (JP) 1997-11-18 US disclosed
US-5213946-A POSITIVE TYPE, PHOTOSENSITIVE RESINOUS COMPOSITION NIPPON PAINT CO., LTD. (JP) 1993-05-25 US disclosed
EP-0519128-A1 A positive type, photosensitive resinous composition Nippon Paint Co., Ltd. (JP) 1992-12-23 EP disclosed
EP-0487261-A1 Process for forming resist pattern and resist composition therefor FUJITSU LIMITED (JP) 1992-05-27 EP disclosed