⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30210208 | 0.83 | — | — | |
| SCHEMBL13390627 | 0.81 | — | — | |
| SCHEMBL2739909 | 0.79 | POLB (0.34) | — | |
| SCHEMBL13346515 | 0.77 | RAB9A (0.31) | — | |
| SCHEMBL13346517 | 0.77 | CHRNB2 (0.33) | — | |
| SCHEMBL30663529 | 0.77 | MEN1 (0.30) | — | |
| SCHEMBL225707 | 0.77 | CYP1A2 (0.33) | — | |
| SCHEMBL13346527 | 0.75 | PPM1B (0.35) | — | |
| SCHEMBL30663524 | 0.74 | — | — | |
| SCHEMBL14510434 | 0.74 | SMN1; SMN2 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-7714087-B2 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2010-05-11 | — | — | US | disclosed |
| US-20090137757-A1 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | IMUTA JUNICHI | 2009-05-28 | — | — | US | disclosed |
| US-7393907-B2 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2008-07-01 | — | — | US | disclosed |
| JP-2002202604-A | RADIATION SENSITIVE RESIN COMPOSITION | JSR CORP | 2002-07-19 | — | — | JP | disclosed |