Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | APEX1 | P27695 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | GABRR1 | P24046 | 1/20 | 0.32 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.31 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13390627 | 0.83 | — | — | |
| SCHEMBL13346515 | 0.83 | RAB9A (0.31) | — | |
| SCHEMBL13346517 | 0.79 | CHRNB2 (0.33) | — | |
| SCHEMBL22105343 | 0.79 | HSD11B1 (0.35) | TDP1 | |
| SCHEMBL7573428 | 0.79 | — | — | |
| SCHEMBL225707 | 0.79 | CYP1A2 (0.33) | SMN1; SMN2PKM | |
| SCHEMBL30663529 | 0.79 | MEN1 (0.30) | — | |
| SCHEMBL14510434 | 0.76 | SMN1; SMN2 (0.36) | POLBSMN1; SMN2 | |
| SCHEMBL30663524 | 0.76 | — | — | |
| SCHEMBL14516600 | 0.76 | HSD11B1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 159 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4737516-A1 | RUBBER COMPOSITION FOR TIRES, AND TIRE | BRIDGESTONE CORPORATION (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-4737517-A1 | RUBBER COMPOSITION FOR TIRE, AND TIRE | BRIDGESTONE CORPORATION (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-4737515-A1 | RUBBER COMPOSITION FOR TIRES, AND TIRE | BRIDGESTONE CORPORATION (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-4703403-A1 | CATALYST LIQUID AND METHOD FOR PRODUCING CATALYST LIQUID | RIMTEC Corporation (JP) | 2026-03-04 | — | — | EP | disclosed |
| EP-4703402-A1 | POLYMERIZABLE COMPOSITION AND MOLDED ARTICLE | RIMTEC Corporation (JP) | 2026-03-04 | — | — | EP | disclosed |
| EP-4682199-A1 | MEMBER, AND SEMICONDUCTOR MANUFACTURING?RELATED DEVICE | Daikin Industries, Ltd. (JP) | 2026-01-21 | — | — | EP | disclosed |
| EP-4678367-A1 | METHOD FOR MANUFACTURING ALICYCLIC STRUCTURE-CONTAINING POLYMER RECYCLED PRODUCT | Zeon Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| EP-4640736-A1 | RING-OPENED COPOLYMER, RUBBER COMPOSITION, RUBBER CROSS-LINKED PRODUCT, AND TIRE | Zeon Corporation (JP) | 2025-10-29 | — | — | EP | disclosed |
| US-20250263511-A1 | COPOLYMER FORMED BY RING-OPENING COPOLYMERIZATION OF CYCLOOLEFIN, PRODUCTION METHOD THEREFOR, RUBBER COMPOSITION, AND CROSSLINKED RUBBER OBJECT | ZEON CORPORATION (JP) | 2025-08-21 | — | — | US | disclosed |
| EP-3960414-B1 | METHOD FOR PRODUCING CYCLOOLEFIN RESIN-DECORATIVE MOLDED ARTICLE | RIMTEC CORP (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-20080003529-A1 | (Meth)Acrylate, Polymer and Resist Composition | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20080003529-A1 | (Meth)Acrylate, Polymer and Resist Composition | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20070248913-A1 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2007-10-25 | — | — | US | disclosed |
| US-20070248913-A1 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2007-10-25 | — | — | US | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| US-7217495-B2 | Fluorinated polymers, photoresists and processes for microlithography | E I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-05-15 | — | — | US | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |