SCHEMBL757355

SCHEMBL757355

C=COCCCCOC(=O)C(=C)C

nearest known ligand 0.61

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.61
THRB P10828 1/20 0.48
POLB P06746 1/20 0.46
APEX1 P27695 1/20 0.46
HTT P42858 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
ALDH1A1 P00352 5/20 0.41
CYP3A4 P08684 1/20 0.41
HPGD P15428 1/20 0.37
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
ATM Q13315 1/20 0.31
HCAR2 Q8TDS4 2/20 0.31
CDC25A P30304 1/20 0.31
NAAA Q02083 1/20 0.31
RAD52 P43351 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5739016 1.00 TSHR (0.61) TSHRTHRBPOLBAPEX1HTT
SCHEMBL2688287 0.98 TSHR (0.65) TSHRTHRBPOLBAPEX1HTT
SCHEMBL18822943 0.98 TSHR (0.65) TSHRTHRBPOLBAPEX1HTT
SCHEMBL2689893 0.98 TSHR (0.65) TSHRTHRBPOLBAPEX1HTT
SCHEMBL18822989 0.98 TSHR (0.65) TSHRTHRBPOLBAPEX1HTT
SCHEMBL18822941 0.98 TSHR (0.65) TSHRTHRBPOLBAPEX1HTT
SCHEMBL278570 0.96 TSHR (0.56) TSHRTHRBPOLBAPEX1HTT
SCHEMBL11096017 0.92 TSHR (0.77) TSHRTHRBPOLBAPEX1HTT
SCHEMBL17785972 0.91 TSHR (0.66) TSHRTHRBPOLBAPEX1HTT
SCHEMBL2880688 0.88 THRB (0.57) TSHRTHRBPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11987715-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-21 US disclosed
US-11965094-B2 Curable organopolysiloxane compositions WACKER CHEMIE AG (DE) 2024-04-23 US disclosed
US-20240052185-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORP (JP) 2024-02-15 US disclosed
US-11884828-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION 2024-01-30 US disclosed
EP-3885413-B1 RADIATION CURABLE INK JET COMPOSITION AND INK JET METHOD SEIKO EPSON CORP (JP) 2023-09-27 EP disclosed
US-20230203275-A1 CURABLE ORGANOPOLYSILOXANE COMPOSITIONS WACKER CHEMIE AG (DE) 2023-06-29 US disclosed
US-11421108-B2 Curable organopolysiloxane compositions WACKER CHEMIE AG (DE) 2022-08-23 US disclosed
EP-3642284-B1 CURABLE ORGANOPOLYSILOXANE COMPOSITIONS WACKER CHEMIE AG (DE) 2022-06-01 EP disclosed
US-20210301162-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORPORATION (JP) 2021-09-30 US disclosed
US-20210301158-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORPORATION (JP) 2021-09-30 US disclosed
US-20070111136-A1 Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, process for manufacturing printed circuit board and method for removing photocured product HITACHI CHEMICAL COMPANY, LTD. (JP) 2007-05-17 US disclosed
US-20070049768-A1 COMPOSITION OF VINYL ETHER GROUP CONTAINING (METH) ACRYLIC ACID ESTER AND PRODUCTION METHOD THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-01 US disclosed
EP-1561792-B1 New ink compositions for ink jet printing AGFA GEVAERT (BE) 2006-08-30 EP disclosed
EP-1561792-A1 New ink compositions for ink jet printing Agfa-Gevaert (BE) 2005-08-10 EP disclosed
EP-1505090-A1 REACTIVE DILUENT COMPOSITION AND CURABLE RESIN COMPOSITION Nippon Shokubai Co., Ltd. (JP) 2005-02-09 EP disclosed
US-6767980-B2 ACTIVATED ENERGY RAY-CURABLE INK COMPOSITION FOR INK-JET PRINTING; VINYL ETHER GROUP-CONTAINING (METH)ACRYLIC ESTER NIPPON SHOKUBAI CO., LTD. (JP) 2004-07-27 US disclosed
US-20030199655-A1 Reactive diluent and curable resin composition NIPPON SHOKUBAI CO., LTD. 2003-10-23 US disclosed
US-20020143120-A1 Composition of vinyl ether group-containing (meth) acrylic acid ester and production method thereof NIPPON SHOKUBAI CO., LTD. 2002-10-03 US disclosed
EP-1201641-A2 Composition of vinyl ether group containing (meth)acrylic acid ester and production method thereof Nippon Shokubai Co., Ltd. (JP) 2002-05-02 EP disclosed
US-5914427-A Preparation of ω-hydroxyesiers of α,β-unsaturated carboxylic acids BASF AKTIENGESELLSHAFT (DE) 1999-06-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070049768-A1 COMPOSITION OF VINYL ETHER GROUP CONTAINING (METH) ACRYLIC ACID ESTER AND PRODUCTION METHOD THEREOF MMAB, ME1, PRMT1 TSHR 2551/4885THRB 1335/4885POLB 3713/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.