Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA4 | P22748 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7708787 | 0.73 | NPC1 (0.39) | KMT2AMEN1NPC1RAB9ACA1 | |
| SCHEMBL244367 | 0.72 | KMT2A (0.41) | KMT2ANPC1RAB9ACA1CA2 | |
| SCHEMBL6363605 | 0.70 | CA1 (0.33) | KMT2ANPC1RAB9ACA1CA2 | |
| SCHEMBL14442071 | 0.68 | CA1 (0.45) | KMT2ANPC1RAB9ACA1CA2 | |
| SCHEMBL8879148 | 0.65 | CA1 (0.42) | KMT2ANPC1RAB9ACA1CA2 | |
| SCHEMBL28195887 | 0.64 | CA1 (0.36) | KMT2ACA1CA2CA4 | |
| SCHEMBL7708785 | 0.64 | CA1 (0.33) | KMT2ACA1CA2CA4ALDH1A1 | |
| SCHEMBL14508480 | 0.62 | CA1 (0.39) | KMT2ANPC1RAB9ACA1CA2 | |
| Sulfuric Acid SCHEMBL15345265 | 0.62 | KMT2A (0.32) | KMT2AALDH1A1MAPT | |
| SCHEMBL14398419 | 0.61 | KDM4E (0.38) | KMT2ANPC1RAB9ACA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7078444-B2 | Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-07-18 | — | — | US | claimed |
| US-20050158655-A1 | Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2005-07-21 | — | — | US | claimed |
| US-6841333-B2 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2005-01-11 | — | — | US | claimed |
| US-20040234888-A1 | Photoacid generators with perfluorinated multifunctional anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-11-25 | — | — | US | claimed |
| US-20040087690-A1 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-05-06 | — | — | US | claimed |
| CN-118459372-A | Preparation method of photoacid generator sulfonate for ARF photoresist | 常州朗芯新材料科技有限公司 | 2024-08-09 | — | — | CN | disclosed |
| WO-2023053877-A1 | PHOTOACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE USING SAID RESIST COMPOSITION | 東洋合成工業株式会社 | 2023-04-06 | — | — | WO | disclosed |
| EP-3346335-A1 | MATERIAL FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, PATTERN FORMING METHOD, RESIN, AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-07-11 | — | — | EP | disclosed |
| EP-2955577-B1 | COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-01-31 | — | — | EP | disclosed |
| EP-3269712-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING COMPOUND OR RESIN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-01-17 | — | — | EP | disclosed |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| EP-3239141-A1 | COMPOUND, RESIN, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-11-01 | — | — | EP | disclosed |
| EP-1556740-A2 | IONIC PHOTOACID GENERATORS WITH SEGMENTED HYDROCARBON-FLUOROCARBON SULFONATE ANIONS | 3M Innovative Properties Company (US) | 2005-07-27 | — | — | EP | disclosed |
| US-20050158655-A1 | Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2005-07-21 | — | — | US | disclosed |
| US-6841333-B2 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2005-01-11 | — | — | US | disclosed |
| WO-2004107051-A2 | PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2004-12-09 | — | — | WO | disclosed |
| US-20040234888-A1 | Photoacid generators with perfluorinated multifunctional anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-11-25 | — | — | US | disclosed |
| US-20040191479-A1 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-09-30 | — | — | US | disclosed |
| WO-2004042473-A2 | IONIC PHOTOACID GENERATORS WITH SEGMENTED HYDROCARBON-FLUOROCARBON SULFONATE ANIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2004-05-21 | — | — | WO | disclosed |
| US-20040087690-A1 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-05-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | KMT2A 503/4885MEN1 965/4885NPC1 3515/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.