SCHEMBL758797

SCHEMBL758797

CSc1c(C)cc(C)cc1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 4/20 0.41
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
ALDH1A1 P00352 3/20 0.35
LMNA P02545 2/20 0.35
GAA P10253 2/20 0.35
MAPT P10636 2/20 0.35
KDM4E B2RXH2 1/20 0.35
TP53 P04637 2/20 0.33
HSD17B10 Q99714 2/20 0.33
HPGD P15428 1/20 0.33
ALOX15 P16050 1/20 0.33
ALOX12 P18054 1/20 0.33
TSHR P16473 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2A6 P11509 1/20 0.33
TDP1 Q9NUW8 1/20 0.32
AR P10275 2/20 0.32
CRHR1 P34998 1/20 0.31
CA1 P00915 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2051299 0.82 SELL (0.46) RAPGEF4MEN1KMT2AALDH1A1LMNA
SCHEMBL20669678 0.82 RAPGEF4 (0.33) RAPGEF4MEN1KMT2AAR
SCHEMBL24344714 0.78 SMN1; SMN2 (0.46) RAPGEF4MEN1KMT2AALDH1A1MAPT
SCHEMBL9935610 0.78 RAPGEF4 (0.43) RAPGEF4MEN1KMT2AALDH1A1LMNA
Dimesityl Disulfide SCHEMBL896126 0.78 RAPGEF4 (0.43) RAPGEF4MEN1KMT2AALDH1A1LMNA
SCHEMBL22859266 0.77 RAPGEF4 (0.32) RAPGEF4
SCHEMBL3121456 0.77 NQO2 (0.33)
SCHEMBL2790222 0.77 CYP3A4 (0.48) MEN1KMT2AALDH1A1LMNAGAA
SCHEMBL24501052 0.77 RAPGEF4 (0.30) RAPGEF4
SCHEMBL22380333 0.77 SHBG (0.34) RAPGEF4MEN1KMT2AALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024059472-A1 MACROCYCLIC IMMUNOMODULATORS BRISTOL-MYERS SQUIBB COMPANY (US) 2024-03-21 WO disclosed
WO-2023247595-A1 PYRAZOLOPYRAZINE CARBOXAMIDES AND THEIR USES AS PDGFR INHIBITORS ACTELION PHARMACEUTICALS LTD (CH) 2023-12-28 WO disclosed
WO-2023004240-A1 MACROCYLIC IMMUNOMODULATORS BRISTOL-MYERS SQUIBB COMPANY (US) 2023-01-26 WO disclosed
WO-2023288213-A1 MACROCYCLIC IMMUNOMODULATORS BRISTOL-MYERS SQUIBB COMPANY (US) 2023-01-19 WO disclosed
US-20220334477-A1 COLORED CURABLE RESIN COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-10-20 US disclosed
EP-3845531-A1 SUBSTITUTED PYRAZOLE FUSED RING DERIVATIVE, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF Applied Pharmaceutical Science, Inc. (CN) 2021-07-07 EP disclosed
EP-3532477-B1 FUSED BICYLIC PYRIDINE COMPOUNDS AND THEIR USE AS AMPA RECEPTOR MODULATORS JANSSEN PHARMACEUTICA NV (BE) 2020-08-26 EP disclosed
WO-2018080917-A1 FUSED BICYLIC PYRIDINE COMPOUNDS AND THEIR USE AS AMPA RECEPTOR MODULATORS JANSSEN PHARMACEUTICA NV (BE) 2018-05-03 WO disclosed
EP-2826783-B1 Ruthenium and Osmium Heterocyclic Carbene Metathesis Catalysts BERGEN TEKNOLOGIOVERFØRING AS (NO) 2016-04-27 EP disclosed
CN-105409037-A Process for producing active cathode material comprising mixture of metal oxide and metal sulfide and use of active cathode material in rechargeable electrochemical cells BASF SE 2016-03-16 CN disclosed
US-20090233142-A2 POLYMER HAVING OXOCARBON GROUP, AND USE THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-09-17 US disclosed
US-20090197763-A1 Aromatic block copolymer, decomposition method thereof and analysis method using the decomposition method SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-08-06 US disclosed
US-20090110995-A1 POLYMER HAVING OXYCARBON GROUP, AND USE THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-04-30 US disclosed
US-7338740-B2 Positive resist composition FUJIFILM CORPORATION (JP) 2008-03-04 US disclosed
US-7279265-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-10-09 US disclosed
US-20070218335-A1 POLYMER HAVING OXOCARBON GROUP, AND USE THEREOF KAO CORPORATION (JP) 2007-09-20 US disclosed
US-7250246-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-07-31 US disclosed
US-7179578-B2 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed
US-7160335-B2 Anthraquinone dyes CIBA SPECIALTY CHEMICALS CORPORATION (US) 2007-01-09 US disclosed
US-7160335-B2 Anthraquinone dyes CIBA SPECIALTY CHEMICALS CORPORATION (US) 2007-01-09 US disclosed