Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 2/20 | 0.54 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | VCAM1 | P19320 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.42 |
| ▸ | FBP1 | P09467 | 3/20 | 0.41 |
| ▸ | VCP | P55072 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | APP | P05067 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5882248 | 0.87 | XDH (0.42) | CYP19A1TSHRLMNAVCAM1ALDH1A1 | |
| SCHEMBL16951430 | 0.86 | CYP19A1 (0.40) | CYP19A1TSHRLMNACYP3A4ALDH1A1 | |
| SCHEMBL16959336 | 0.86 | TSHR (0.63) | CYP19A1TSHRLMNACYP3A4ALDH1A1 | |
| SCHEMBL16955664 | 0.86 | LMNA (0.42) | CYP19A1TSHRLMNAVCAM1CYP3A4 | |
| SCHEMBL13228708 | 0.86 | ALDH1A1 (0.46) | CYP19A1TSHRALDH1A1NFE2L2FBP1 | |
| SCHEMBL22426071 | 0.86 | AMY1A (0.53) | CYP19A1TSHRLMNASMN1; SMN2ALDH1A1 | |
| SCHEMBL8418032 | 0.84 | CYP19A1 (0.39) | CYP19A1TSHRLMNAVCAM1CYP3A4 | |
| SCHEMBL27969972 | 0.83 | TSHR (0.56) | CYP19A1TSHRLMNAALDH1A1NFE2L2 | |
| SCHEMBL8418034 | 0.82 | TSHR (0.50) | CYP19A1TSHRLMNAVCAM1CYP3A4 | |
| SCHEMBL3130397 | 0.81 | TP53 (0.50) | LMNACYP3A4SMN1; SMN2ALDH1A1FBP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117866000-B | Diamine monomer with nitrogen heterocycle and siloxane structure, and preparation method and application thereof | 波米科技有限公司 | 2024-06-21 | — | — | CN | claimed |
| CN-117866000-A | Diamine monomer with nitrogen heterocycle and siloxane structure, and preparation method and application thereof | 波米科技有限公司 | 2024-04-12 | — | — | CN | claimed |
| CN-117866000-B | Diamine monomer with nitrogen heterocycle and siloxane structure, and preparation method and application thereof | 波米科技有限公司 | 2024-06-21 | — | — | CN | disclosed |
| CN-117866000-A | Diamine monomer with nitrogen heterocycle and siloxane structure, and preparation method and application thereof | 波米科技有限公司 | 2024-04-12 | — | — | CN | disclosed |
| US-9927708-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9658532-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-23 | — | — | US | disclosed |
| US-9658532-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-23 | — | — | US | disclosed |
| US-9632415-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9632415-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9618850-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9618850-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-20160124312-A1 | PATTERN FORMING PROCESS AND SHRINK AGENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-05 | — | — | US | disclosed |
| US-20160124312-A1 | PATTERN FORMING PROCESS AND SHRINK AGENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-05 | — | — | US | disclosed |
| US-20160124313-A1 | PATTERN FORMING PROCESS AND SHRINK AGENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-05 | — | — | US | disclosed |
| US-6448442-B1 | X-RAY CONTRAST AGENTS; LOW VISCOSITY IODINATED ARYL COMPOUNDS | AMERSHAM HEALTH AS (NO) | 2002-09-10 | — | — | US | disclosed |
| US-6310243-B1 | BENZENE COMPOUNDS IN WHICH 3 NON-ADJACENT RING ATOMS ARE SUBSTITUTED WITH IODINE, 2 OF THE REMAINING RING ATOMS ARE AMIDE SUBSTITUTED WITH HYDROXY AND THE OTHER REMAINING RING ATOM IS A NON-AMIDE, HYDROXY-SUBSTITUTED NONIONIC MOIETY | NYCOMED IMAGING AS (NO) | 2001-10-30 | — | — | US | disclosed |
| US-5993780-A | A POLYIODOARYLALKYL ALCOHOL OR DERIVATIVE | NYCOMED IMAGING AS (NO) | 1999-11-30 | — | — | US | disclosed |
| US-5882628-A | Contrast media | NYCOMED IMAGING AS (NO) | 1999-03-16 | — | — | US | disclosed |
| EP-0782564-A1 | IODINATED X-RAY CONTRAST MEDIA | NYCOMED IMAGING AS (NO) | 1997-07-09 | — | — | EP | disclosed |
| WO-1996009282-A1 | IODINATED X-RAY CONTRAST MEDIA | NYCOMED IMAGING A/S (NO) | 1996-03-28 | — | — | WO | disclosed |