Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 7/20 | 0.50 |
| ▸ | SRC | P12931 | 1/20 | 0.46 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.43 |
| ▸ | CTSG | P08311 | 1/20 | 0.43 |
| ▸ | CTRB1 | P17538 | 1/20 | 0.43 |
| ▸ | CMA1 | P23946 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL1261034 | 0.89 | AKT1 (0.46) | CES1SRCPRSS1CTSGCTRB1 | |
| Hydrogen Peroxide SCHEMBL29060971 | 0.84 | CES1 (0.52) | CES1SRCPRSS1CTSGCTRB1 | |
| SCHEMBL1728463 | 0.84 | CES1 (0.52) | CES1SRCPRSS1CTSGCTRB1 | |
| SCHEMBL13854706 | 0.83 | ALDH1A1 (0.47) | HPGDALDH1A1 | |
| SCHEMBL1645558 | 0.83 | CES1 (0.47) | CES1SRCPRSS1CTSGCTRB1 | |
| SCHEMBL6223670 | 0.83 | RIPK1 (0.50) | CES1SRCPRSS1CTSGCTRB1 | |
| SCHEMBL3933601 | 0.83 | CES1 (0.50) | CES1SRCPRSS1CTSGCTRB1 | |
| SCHEMBL21109870 | 0.81 | CES1 (0.58) | CES1SRCTDP1MAPK1KDM4E | |
| SCHEMBL11889616 | 0.81 | USP5 (0.42) | SRCSMN1; SMN2POLBALDH1A1HIF1A | |
| SCHEMBL9076468 | 0.81 | CES1 (0.48) | CES1SRCPRSS1CTSGCTRB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 218 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12624392-B2 | Molecular array generation using photoresist | 10X GENOMICS, INC. (US) | 2026-05-12 | — | — | US | disclosed |
| EP-3753997-B1 | LATENT ADDITIVE AND COMPOSITION CONTAINING LATENT ADDITIVE | ADEKA CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-3819291-B1 | OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING SAME | ADEKA CORP (JP) | 2026-04-15 | — | — | EP | disclosed |
| US-12534649-B2 | Radiation-curable organopolysiloxane composition and a release sheet | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-27 | — | — | US | disclosed |
| US-12479940-B2 | Amide compound, polymerizable composition, cured material, and method of manufacturing cured material | ADEKA CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| US-12269917-B2 | Curable resin composition | ADEKA CORPORATION (JP) | 2025-04-08 | — | — | US | disclosed |
| EP-4516394-A2 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10x Genomics, Inc. (US) | 2025-03-05 | — | — | EP | disclosed |
| WO-2025041606-A1 | METHOD FOR CURING PHOTOCURABLE COMPOSITION THROUGH UV-LED IRRADIATION, AND METHOD FOR PRODUCING CURED PRODUCT OF SAID PHOTOCURABLE COMPOSITION | 信越化学工業株式会社 | 2025-02-27 | — | — | WO | disclosed |
| WO-2025027985-A1 | COMPOSITION, BLACK MATRIX, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND DISPLAY DEVICE | 株式会社ADEKA | 2025-02-06 | — | — | WO | disclosed |
| EP-4481059-A2 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10x Genomics, Inc. (US) | 2024-12-25 | — | — | EP | disclosed |
| US-20040092688-A1 | Process and apparatus for production of water-absorbent resin | NIPPON SHOKUBAI CO., LTD. (JP) | 2004-05-13 | — | — | US | disclosed |
| EP-1418000-A2 | Process and apparatus for production of water-absorbent resin | Nippon Shokubai Co., Ltd. (JP) | 2004-05-12 | — | — | EP | disclosed |
| EP-1403665-A2 | Antireflection films and their manufacture | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-20040058177-A1 | Antireflection film and making method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-03-25 | — | — | US | disclosed |
| EP-1036789-B1 | NOVEL AROMATIC SULFONIUM COMPOUNDS, PHOTOACID GENERATORS COMPRISING THE SAME, PHOTOPOLYMERIZABLE COMPOSITIONS CONTAINING THE SAME, STEREOLITHOGRAPHIC RESIN COMPOSITIONS, AND STEREOLITHOGRAPHIC PROCESS | ASAHI DENKA KOGYO KK (JP) | 2003-03-05 | — | — | EP | disclosed |
| US-6368769-B1 | PHOTOPOLYMERIZATION | ASAHI DENKI KOGYO KABUSHIKI KAISHA (JP) | 2002-04-09 | — | — | US | disclosed |
| US-6319652-B1 | TO FORM CURED RESIN HAVING DIMENSIONAL STABILITY, HUMIDITY ABSORPTION, CHEMICAL RESISTANCE; FOR STEREOLITHOGRAPHY | ASAHI KOGAKU KOGYO KABUSHIKI KAISHA (JP) | 2001-11-20 | — | — | US | disclosed |
| EP-1036789-A1 | NOVEL AROMATIC SULFONIUM COMPOUNDS, PHOTOACID GENERATORS COMPRISING THE SAME, PHOTOPOLYMERIZABLE COMPOSITIONS CONTAINING THE SAME, STEREOLITHOGRAPHIC RESIN COMPOSITIONS, AND STEREOLITHOGRAPHIC PROCESS | ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) | 2000-09-20 | — | — | EP | disclosed |
| US-5985510-A | STEREOLITHOGRAPHY, EXPOSURE TO BEAMS, CURING, MOLDING AN EPOXYCYCLOHEXANE | ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) | 1999-11-16 | — | — | US | disclosed |
| EP-0844262-A2 | Energy beam curable epoxy resin composition, stereolithographic resin composition and stereolithographic method | ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) | 1998-05-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12624392-B2 | Molecular array generation using photoresist | POLL, LIG4, LIG3 | CES1 3184/4885SRC 1328/4885PRSS1 4349/4885 |
| US-12534649-B2 | Radiation-curable organopolysiloxane composition and a release sheet | RAD51, MSR1, RAD1 | CES1 207/4885SRC 3806/4885PRSS1 3311/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.