Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.53 |
| ▸ | NPC1 | O15118 | 4/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.49 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.49 |
| ▸ | MAOA | P21397 | 1/20 | 0.48 |
| ▸ | MAOB | P27338 | 1/20 | 0.48 |
| ▸ | PPARG | P37231 | 1/20 | 0.47 |
| ▸ | PPARA | Q07869 | 1/20 | 0.47 |
| ▸ | IDO1 | P14902 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | FNTA | P49354 | 1/20 | 0.45 |
| ▸ | FNTB | P49356 | 1/20 | 0.45 |
| ▸ | ELANE | P08246 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL338116 | 0.91 | MAOA (0.58) | MEN1KMT2ANPC1LMNASLC6A4 | |
| SCHEMBL3241580 | 0.89 | MEN1 (0.50) | MEN1KMT2AKDM4ENPC1RAB9A | |
| SCHEMBL10055053 | 0.89 | ALDH1A1 (0.57) | MEN1KMT2AKDM4ENPC1RAB9A | |
| SCHEMBL5317061 | 0.86 | HAO1 (0.56) | MEN1KMT2AKDM4ENPC1SLC6A4 | |
| SCHEMBL332623 | 0.84 | MAOA (0.63) | MEN1KMT2AKDM4ENPC1RAB9A | |
| SCHEMBL510742 | 0.83 | TSHR (0.54) | MEN1KMT2AKDM4ENPC1RAB9A | |
| SCHEMBL30820091 | 0.82 | ESR1 (0.46) | MEN1KMT2AKDM4ENPC1RAB9A | |
| SCHEMBL156793 | 0.80 | TP53 (0.56) | MEN1KMT2AKDM4ENPC1RAB9A | |
| SCHEMBL13047673 | 0.79 | MEN1 (0.53) | MEN1KMT2AKDM4ENPC1RAB9A | |
| SCHEMBL7779170 | 0.79 | MEN1 (0.67) | MEN1KMT2ANPC1RAB9AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120065622-A | Photosensitive resin composition and method for producing microlens | 东京应化工业株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-110317174-B | Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118829948-A | Method for manufacturing plating shaped article | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118742854-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-10-01 | — | — | CN | disclosed |
| CN-115772257-B | Modifier for high-heat-resistance polyester, preparation method of modifier, preparation method of polyester by using modifier and obtained polyester | 中国石油化工股份有限公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-116635788-A | Photosensitive dry film, laminated film, method for producing laminated film, and method for producing patterned resist film | 东京应化工业株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-116157739-A | Chemically amplified photosensitive composition, photosensitive dry film, method for producing substrate with plating mold, and method for producing plating molded article | 东京应化工业株式会社 | 2023-05-23 | — | — | CN | disclosed |
| CN-115135407-A | Two-layer seamless capsule with water-soluble composition as inner coating | 富士胶囊股份有限公司 | 2022-09-30 | — | — | CN | disclosed |
| CN-108707186-B | Human sperm specific antigen epitope peptide, polymer and application thereof | 桂林医学院 | 2021-11-09 | — | — | CN | disclosed |
| EP-1262502-A1 | A printing relief and an adhesive material for making the same | Kyoeisha Chemical Co., Ltd. (JP) | 2002-12-04 | — | — | EP | disclosed |
| US-20020174946-A1 | Printing relief and an adhesive material for making the same | KYOEISHA CHEMICAL CO., LTD. (JP) | 2002-11-28 | — | — | US | disclosed |
| WO-1998007752-A1 | SELF-ASSEMBLING AMPHIPHILES FOR CONSTRUCTION OF PEPTIDE SECONDARY STRUCTURES | REGENTS OF THE UNIVERSITY OF MINNESOTA (US) | 1998-02-26 | — | — | WO | disclosed |
| US-5399596-A | Cationic polymerization, production of epoxy resins, polystyrene, polyorthoesters, polyorthocarbonates | SANSHIN KAGAKU KOGYO CO., LTD. (JP) | 1995-03-21 | — | — | US | disclosed |
| EP-0393893-B1 | Sulfonium compound and polymerisation initator comprising the sulfonium compound as the main ingredient | SANSHIN KAGAKU KOGYO KK (JP) | 1995-01-11 | — | — | EP | disclosed |
| EP-0331496-B1 | POLYFLUORIDE SULFONIUM COMPOUNDS AND POLYMERIZATION INITIATOR THEREOF | SANSHIN KAGAKU KOGYO CO., LTD. (JP) | 1992-09-16 | — | — | EP | disclosed |
| EP-0393893-A1 | Sulfonium compound and polymerisation initator comprising the sulfonium compound as the main ingredient | SANSHIN KAGAKU KOGYO CO., LTD. (JP) | 1990-10-24 | — | — | EP | disclosed |
| EP-0331496-A1 | Polyfluoride sulfonium compounds and polymerization initiator thereof | SANSHIN KAGAKU KOGYO CO., LTD. (JP) | 1989-09-06 | — | — | EP | disclosed |
| US-4304940-A | CATALYST SELECTIVITY | BAYER AKTIENGESELLSCHAFT (DE) | 1981-12-08 | — | — | US | disclosed |
| EP-0025519-A1 | Process for the production of 2-alkyl- or 2-arylthiomethyl phenol | BAYER AG (DE) | 1981-03-25 | — | — | EP | disclosed |