SCHEMBL7601080

SCHEMBL7601080

C=CCc1nnc(N)nc1CC=C

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
IMPDH2 P12268 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9287252 0.81
SCHEMBL3856071 0.76 NPSR1 (0.30) NPSR1
SCHEMBL11208926 0.70 DHFR (0.36)
SCHEMBL3856069 0.69 NPSR1 (0.31) ALDH1A1NPSR1
SCHEMBL21806672 0.68
SCHEMBL17961910 0.68
SCHEMBL7937567 0.67
SCHEMBL3887504 0.67
SCHEMBL11130368 0.66
SCHEMBL8281081 0.66 LMNA (0.32) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020005017-A1 Polishing cycles JSR CORPORATION (JP) 2002-01-17 US claimed
EP-1138734-A2 Aqueous dispersion for chemical mechanical polishing of metal films JSR Corporation (JP) 2001-10-04 EP claimed
US-20020005017-A1 Polishing cycles JSR CORPORATION (JP) 2002-01-17 US disclosed
EP-1138734-A2 Aqueous dispersion for chemical mechanical polishing of metal films JSR Corporation (JP) 2001-10-04 EP disclosed