SCHEMBL7602935

SCHEMBL7602935

C=CCN(CC=C)CCn1nnnc1S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2979279 0.77 ALDH1A1 (0.35)
SCHEMBL8016458 0.73 HTT (0.37)
SCHEMBL912644 0.73 UBE2M (0.36)
Hydrochloric Acid SCHEMBL9662206 0.72 DCUN1D1 (0.39)
Ammonia Solution, Strong SCHEMBL10363130 0.72 UBE2M (0.36)
SCHEMBL13232295 0.69 ALDH1A1 (0.34)
SCHEMBL9768563 0.66
SCHEMBL2561990 0.66
SCHEMBL1142098 0.66
SCHEMBL14267048 0.66 LMNA (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020005017-A1 Polishing cycles JSR CORPORATION (JP) 2002-01-17 US claimed
EP-1138734-A2 Aqueous dispersion for chemical mechanical polishing of metal films JSR Corporation (JP) 2001-10-04 EP claimed
US-20020005017-A1 Polishing cycles JSR CORPORATION (JP) 2002-01-17 US disclosed
EP-1138734-A2 Aqueous dispersion for chemical mechanical polishing of metal films JSR Corporation (JP) 2001-10-04 EP disclosed