Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.55 |
| ▸ | CYP2C9 | P11712 | 5/20 | 0.55 |
| ▸ | CYP2C19 | P33261 | 5/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.55 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 3/20 | 0.53 |
| ▸ | GAA | P10253 | 2/20 | 0.53 |
| ▸ | POLB | P06746 | 1/20 | 0.53 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | CREBBP | Q92793 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.41 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.41 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.41 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16601567 | 0.86 | LMNA (0.46) | ALDH1A1CYP2C9CYP2C19SMN1; SMN2CYP3A4 | |
| SCHEMBL9463318 | 0.82 | ALDH1A1 (0.52) | ALDH1A1CYP2C9CYP2C19SMN1; SMN2CYP3A4 | |
| SCHEMBL15744622 | 0.77 | LMNA (0.53) | ALDH1A1CYP2C9CYP2C19SMN1; SMN2CYP3A4 | |
| SCHEMBL12858738 | 0.76 | ALDH1A1 (0.55) | ALDH1A1CYP2C9CYP2C19SMN1; SMN2CYP3A4 | |
| SCHEMBL24489881 | 0.76 | ALDH1A1 (0.50) | ALDH1A1CYP2C9CYP2C19SMN1; SMN2CYP3A4 | |
| SCHEMBL15820465 | 0.76 | ALDH1A1 (0.53) | ALDH1A1CYP2C9CYP2C19SMN1; SMN2CYP3A4 | |
| SCHEMBL16426557 | 0.76 | ALDH1A1 (0.50) | ALDH1A1CYP2C9CYP2C19SMN1; SMN2CYP3A4 | |
| SCHEMBL20986728 | 0.76 | HTR3E (0.46) | ALDH1A1CYP2C9CYP2C19SMN1; SMN2CYP3A4 | |
| SCHEMBL20986729 | 0.76 | HTR3E (0.46) | ALDH1A1CYP2C9CYP2C19SMN1; SMN2CYP3A4 | |
| SCHEMBL15085995 | 0.74 | ALDH1A1 (0.53) | ALDH1A1CYP2C9CYP2C19SMN1; SMN2CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12038692-B2 | Method for producing substrate with patterned film and fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038691-B2 | Method for producing substrate with patterned film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240069257-A1 | CHOLESTERIC LIQUID CRYSTAL LAYER, METHOD OF FORMING CHOLESTERIC LIQUID CRYSTAL LAYER, LAMINATE, LIGHT GUIDE ELEMENT, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| US-20240069257-A1 | CHOLESTERIC LIQUID CRYSTAL LAYER, METHOD OF FORMING CHOLESTERIC LIQUID CRYSTAL LAYER, LAMINATE, LIGHT GUIDE ELEMENT, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| US-11828960-B2 | Cholesteric liquid crystal layer, method of forming cholesteric liquid crystal layer, laminate, light guide element, and image display device | FUJIFILM CORPORATION (JP) | 2023-11-28 | — | — | US | disclosed |
| US-20230367049-A1 | COLORED COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-16 | — | — | US | disclosed |
| US-11782196-B2 | Cholesteric liquid crystal layer and method for forming cholesteric liquid crystal layer | FUJIFILM CORPORATION (JP) | 2023-10-10 | — | — | US | disclosed |
| US-11782196-B2 | Cholesteric liquid crystal layer and method for forming cholesteric liquid crystal layer | FUJIFILM CORPORATION (JP) | 2023-10-10 | — | — | US | disclosed |
| US-20220214485-A1 | OPTICAL LAMINATE, LIGHT GUIDE ELEMENT, AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2022-07-07 | — | — | US | disclosed |
| US-20220146891-A1 | OPTICAL ELEMENT AND METHOD OF MANUFACTURING OPTICAL ELEMENT | FUJIFILM CORPORATION (JP) | 2022-05-12 | — | — | US | disclosed |
| US-20080090027-A1 | Composition, retardation plate, and liquid-crystal display device | FUJIFILM CORPORATION (JP) | 2008-04-17 | — | — | US | disclosed |
| US-20080090027-A1 | Composition, retardation plate, and liquid-crystal display device | FUJIFILM CORPORATION (JP) | 2008-04-17 | — | — | US | disclosed |
| US-7285369-B2 | photoresist composition comprising resins that increases solubility in alkali developing solution by the action of an acid and photoacid generators, which exhibits high sensitivity, high resolution and stability | FUJIFILM CORPORATION (JP) | 2007-10-23 | — | — | US | disclosed |
| US-7285369-B2 | photoresist composition comprising resins that increases solubility in alkali developing solution by the action of an acid and photoacid generators, which exhibits high sensitivity, high resolution and stability | FUJIFILM CORPORATION (JP) | 2007-10-23 | — | — | US | disclosed |
| US-20070172768-A1 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070141474-A1 | Copolymer with phosphoryl group and molded articles of same | EBARA CORPORATION (JP) | 2007-06-21 | — | — | US | disclosed |
| US-20070141513-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-06-21 | — | — | US | disclosed |
| US-20070141513-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-06-21 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-20070059639-A1 | Positive resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-15 | — | — | US | disclosed |