SCHEMBL7613145

SCHEMBL7613145

CCC(C)c1cc(C(C)(C)c2ccc(Oc3ccc(N)cc3)c(C(C)CC)c2)ccc1Oc1ccc(N)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RORC P51449 1/20 0.52
MAPT P10636 7/20 0.47
RAB9A P51151 4/20 0.47
NPC1 O15118 2/20 0.47
ALDH1A1 P00352 6/20 0.44
HPGD P15428 1/20 0.44
MAPK1 P28482 1/20 0.44
L3MBTL1 Q9Y468 2/20 0.42
LMNA P02545 1/20 0.42
ATM Q13315 1/20 0.42
TDP1 Q9NUW8 4/20 0.37
TSHR P16473 2/20 0.37
HTR2A P28223 1/20 0.35
SLC6A4 P31645 1/20 0.35
KCNH2 Q12809 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
CYP3A4 P08684 1/20 0.34
POLB P06746 2/20 0.34
KDM4E B2RXH2 1/20 0.34
TEAD4 Q15561 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8152742 0.86 ALDH1A1 (0.49) RORCMAPTRAB9ANPC1ALDH1A1
SCHEMBL10712264 0.86 MAPT (0.45) RORCMAPTRAB9ANPC1ALDH1A1
SCHEMBL17660080 0.82 TDP1 (0.46) MAPTRAB9ANPC1ALDH1A1HPGD
SCHEMBL8580831 0.81 TSHR (0.39) MAPTRAB9ANPC1ALDH1A1L3MBTL1
SCHEMBL8153194 0.81 TDP1 (0.39) MAPTRAB9ANPC1ALDH1A1L3MBTL1
SCHEMBL8157894 0.81 TDP1 (0.39) MAPTRAB9ANPC1ALDH1A1HPGD
SCHEMBL349321 0.79 RORC (0.45) RORCMAPTALDH1A1HPGDL3MBTL1
SCHEMBL8158618 0.79 MAPT (0.51) MAPTRAB9ANPC1ALDH1A1HPGD
SCHEMBL8579683 0.78 ACACB (0.42) MAPTRAB9AALDH1A1TDP1TSHR
SCHEMBL8157881 0.77 MAPT (0.51) MAPTRAB9ANPC1ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4435560-A HEAT RESISTANT, GOOD PROCESSABILITY HITACHI, LTD. (JP) 1984-03-06 US claimed
US-20020151659-A1 Formed from 6,6'-bis(2-(4-fluorophenyl)-4- phenylquinoline) and 4,4'-(1,1,1,3,3,3-hexafluoro-2,2-propylidene)bisphenol and 2,2-bis((4-maleimidophenoxy)phenyl)propane; dielectrics HITACHI CHEMICAL CO., LTD. (JP) 2002-10-17 US disclosed
US-6462148-B1 RESIN COMPOSITION COMPRISING A POLYMER CONTAINING A QUINOLINE RING AND A THERMOSETTING RESIN, AN INSULATING MATERIAL CONSTITUTED BY SAID RESIN COMPOSITION AND AN ADHESIVE FILM, PARTICULARLY A RESIN FOR AN INTERLAYER INSULATION FILM HITACHI CHEMICAL CO., LTD. (JP) 2002-10-08 US disclosed
EP-0700532-B1 ALIGNMENT LAYER FOR LIQUID CRYSTALS AVENTIS RES & TECH GMBH & CO (DE) 2000-03-29 EP disclosed
EP-0604885-B1 Liquid crystal display device HOECHST AG (DE) 1997-12-10 EP disclosed
US-5656340-A Liquid crystal display device HOECHST AKTIENGESELLSCHAFT (DE) 1997-08-12 US disclosed
EP-0476589-B1 Multi-layer wiring substrate and production thereof HITACHI LTD (JP) 1996-06-12 EP disclosed
EP-0708149-A1 Alignment layer material for liquid crystal display devices HOECHST AKTIENGESELLSCHAFT (DE) 1996-04-24 EP disclosed
EP-0700532-A1 ALIGNMENT LAYER FOR LIQUID CRYSTALS HOECHST AKTIENGESELLSCHAFT (DE) 1996-03-13 EP disclosed
EP-0690334-A2 Liquid crystal display device HOECHST AKTIENGESELLSCHAFT (DE) 1996-01-03 EP disclosed
US-5037862-A Excellent mechanical stability in printing HITACHI CHEMICAL COMPANY, LTD. (JP) 1991-08-06 US disclosed
US-4954612-A ORIENTATION CONTROL FOR LIQUID CRYSTAL DISPLAY HITACHI CHEMICAL CO., LTD. (JP) 1990-09-04 US disclosed
EP-0336536-A2 Organic-solvent soluble polyimide and production thereof Hitachi Chemical Co., Ltd. (JP) 1989-10-11 EP disclosed
US-4791157-A REACTING TRIMELLITIC ACID WITH AROMATIC DIAMINE WITH ETHER GROUPS HITACHI CHEMICAL CO. (JP) 1988-12-13 US disclosed
US-4758875-A Resin encapsulated semiconductor device HITACHI, LTD. (JP) 1988-07-19 US disclosed
EP-0032745-B1 ETHER IMIDES AND PROCESS FOR PRODUCING THE SAME Hitachi, Ltd. (JP) 1987-01-07 EP disclosed
EP-0047530-B1 MALEIMIDE RESIN COMPOSITION AND PROCESS FOR ITS PRODUCTION Hitachi, Ltd. (JP) 1986-12-10 EP disclosed
US-4460783-A AMIDATION, CYCLIZATION, DEHYDRATION HITACHI, LTD. (JP) 1984-07-17 US disclosed
US-4435560-A HEAT RESISTANT, GOOD PROCESSABILITY HITACHI, LTD. (JP) 1984-03-06 US disclosed
EP-0032745-A2 Ether imides and process for producing the same Hitachi, Ltd. (JP) 1981-07-29 EP disclosed