⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14499012 | 0.81 | RAPGEF4 (0.30) | — | |
| SCHEMBL3683516 | 0.79 | GPR3 (0.31) | — | |
| SCHEMBL3358050 | 0.78 | PDGFRB (0.37) | — | |
| SCHEMBL13088223 | 0.77 | — | — | |
| SCHEMBL1496700 | 0.77 | ALDH1A1 (0.31) | — | |
| SCHEMBL7709159 | 0.77 | — | — | |
| SCHEMBL16472976 | 0.76 | TTR (0.42) | — | |
| SCHEMBL24533522 | 0.73 | — | — | |
| SCHEMBL17210735 | 0.73 | TTR (0.39) | — | |
| SCHEMBL18244891 | 0.72 | APP (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024059472-A1 | MACROCYCLIC IMMUNOMODULATORS | BRISTOL-MYERS SQUIBB COMPANY (US) | 2024-03-21 | — | — | WO | disclosed |
| WO-2023225661-A1 | MACROCYCLIC IMMUNOMODULATORS | BRISTOL-MYERS SQUIBB COMPANY (US) | 2023-11-23 | — | — | WO | disclosed |
| WO-2023192873-A1 | MACROCYCLIC IMMUNOMODULATORS | BRISTOL-MYERS SQUIBB COMPANY (US) | 2023-10-05 | — | — | WO | disclosed |
| WO-2023102507-A1 | MACROCYCLIC IMMUNOMODULATORS | BRISTOL-MYERS SQUIBB COMPANY (US) | 2023-06-08 | — | — | WO | disclosed |
| WO-2023004240-A1 | MACROCYLIC IMMUNOMODULATORS | BRISTOL-MYERS SQUIBB COMPANY (US) | 2023-01-26 | — | — | WO | disclosed |
| WO-2023288213-A1 | MACROCYCLIC IMMUNOMODULATORS | BRISTOL-MYERS SQUIBB COMPANY (US) | 2023-01-19 | — | — | WO | disclosed |
| US-6461791-B1 | NOVEL POLYMER HAVING HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADIATION OF UP TO 300 NANOMETERS; RESIST MATERIALS HAVE SUFFICIENT TRANSPARENCY IN REGION OF EXCIMER LASER AND SATISFY RESOLUTION AND SENSITIVITY REQUIREMENTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-10-08 | — | — | US | disclosed |
| US-6369279-B1 | STYRENE WITH ETHER OR FLUORINE GROUPS FOR POLYMERS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-09 | — | — | US | disclosed |
| US-6333436-B1 | Styrene derivatives | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-12-25 | — | — | US | disclosed |