SCHEMBL766015

SCHEMBL766015

Cc1ccc(/C=C/C(=O)N2CCCCC2)c(OCc2ccccc2[N+](=O)[O-])c1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.58
MAPT P10636 2/20 0.49
KMT2A Q03164 5/20 0.48
HPGD P15428 3/20 0.47
APP P05067 2/20 0.44
LMNA P02545 4/20 0.44
MEN1 O00255 3/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
KDM4E B2RXH2 1/20 0.43
POLB P06746 2/20 0.43
MITF O75030 1/20 0.43
HTT P42858 1/20 0.43
MAPK1 P28482 1/20 0.43
CACNB4 O00305 1/20 0.42
CACNA1A O00555 1/20 0.42
CACNA1G O43497 1/20 0.42
CACNG3 O60359 1/20 0.42
CACNA1F O60840 1/20 0.42
CACNA1H O95180 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20109832 0.83 ALDH1A1 (0.60) ALDH1A1MAPTKMT2AHPGDLMNA
SCHEMBL21747466 0.78 ALDH1A1 (0.52) ALDH1A1MAPTKMT2ALMNAMEN1
SCHEMBL766041 0.73 APP (0.52) ALDH1A1MAPTKMT2AHPGDAPP
SCHEMBL10230121 0.72 HPGD (0.52) ALDH1A1MAPTKMT2AHPGDAPP
SCHEMBL17616584 0.72 ALDH1A1 (0.49) ALDH1A1MAPTKMT2ALMNAMEN1
SCHEMBL8785755 0.71 APP (0.70) ALDH1A1KMT2AHPGDAPPLMNA
SCHEMBL8785750 0.71 APP (0.70) ALDH1A1KMT2AHPGDAPPLMNA
SCHEMBL8544763 0.71 ALDH1A1 (0.55) ALDH1A1MAPTKMT2AHPGDLMNA
SCHEMBL17616609 0.71 NPC1 (0.57) ALDH1A1MAPTKMT2AHPGDLMNA
SCHEMBL28870104 0.71 GPR183 (0.50) ALDH1A1MAPTKMT2AHPGDAPP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2012-03-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME RER1, SUN2, REV1 ALDH1A1 2053/4885MAPT 852/4885KMT2A 1400/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.