SCHEMBL766041

SCHEMBL766041

Cc1ccc(/C=C/C(=O)N2CCCCC2)c(OC(=O)OCc2ccccc2)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 5/20 0.52
HPGD P15428 3/20 0.50
GPR183 P32249 1/20 0.44
PELI1 Q96FA3 2/20 0.43
KDM4E B2RXH2 4/20 0.42
MAPT P10636 3/20 0.42
LMNA P02545 1/20 0.42
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
BCHE P06276 1/20 0.41
MAOA P21397 1/20 0.41
ACHE P22303 1/20 0.41
MAOB P27338 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ALDH1A1 P00352 1/20 0.41
PTGER1 P34995 1/20 0.40
PTGER4 P35408 1/20 0.40
PTGER3 P43115 1/20 0.40
PTGER2 P43116 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL768669 0.88 APP (0.55) APPHPGDGPR183KDM4EMAPT
SCHEMBL765981 0.83 HPGD (0.49) APPHPGDGPR183PELI1KDM4E
SCHEMBL766030 0.80 HPGD (0.49) HPGDPELI1KDM4EMAPTMEN1
SCHEMBL30023299 0.78 GPR183 (0.50) APPHPGDGPR183PELI1KDM4E
SCHEMBL28870104 0.78 GPR183 (0.50) APPHPGDGPR183PELI1KDM4E
SCHEMBL766009 0.73 HPGD (0.44) HPGDPELI1KDM4EMAPTKMT2A
SCHEMBL766015 0.73 ALDH1A1 (0.58) APPHPGDKDM4EMAPTLMNA
SCHEMBL10227974 0.72 HPGD (0.53) APPHPGDGPR183KDM4EMAPT
SCHEMBL766014 0.72 MAPT (0.55) HPGDPELI1KDM4EMAPTMEN1
SCHEMBL766004 0.72 HPGD (0.49) HPGDPELI1KDM4EMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2012-03-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME RER1, SUN2, REV1 APP 906/4885HPGD 861/4885GPR183 973/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.