SCHEMBL766034

SCHEMBL766034

COCCOc1ccc(/C=C/C(=O)N2CCCCC2)c(O)c1

nearest known ligand 0.52

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
PELI1 Q96FA3 3/20 0.52
TRPV1 Q8NER1 1/20 0.50
HPGD P15428 1/20 0.48
PTGS2 P35354 2/20 0.46
MAOB P27338 8/20 0.46
APP P05067 2/20 0.45
KDM4E B2RXH2 1/20 0.44
ALDH1A1 P00352 1/20 0.44
KMT2A Q03164 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29449824 0.87 TRPV1 (0.58) PELI1TRPV1HPGDPTGS2APP
SCHEMBL10230139 0.87 TRPV1 (0.58) PELI1TRPV1HPGDPTGS2APP
SCHEMBL20109839 0.84 PELI1 (0.48) PELI1TRPV1HPGDPTGS2MAOB
SCHEMBL20109844 0.84 PELI1 (0.46) PELI1TRPV1HPGDPTGS2MAOB
SCHEMBL10321418 0.83 PELI1 (0.49) PELI1TRPV1HPGDPTGS2MAOB
SCHEMBL10321420 0.83 PELI1 (0.49) PELI1TRPV1HPGDPTGS2MAOB
SCHEMBL20109836 0.82 PELI1 (0.55) PELI1TRPV1HPGDPTGS2MAOB
SCHEMBL3213628 0.81 MAPT (0.45) APPKDM4EALDH1A1KMT2A
SCHEMBL3213635 0.81 MAPT (0.45) APPKDM4EALDH1A1KMT2A
SCHEMBL20109834 0.81 PELI1 (0.45) PELI1TRPV1HPGDPTGS2MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2725011-B1 NOVEL BASE GENERATOR AND ADHESION ENHANCER TOKYO OHKA KOGYO CO LTD (JP) 2021-10-27 EP disclosed
US-20160170302-A1 NOVEL COMPOUND TOKYO OHKA KOGYO CO LTD (JP) 2016-06-16 US disclosed
US-20160170302-A1 NOVEL COMPOUND TOKYO OHKA KOGYO CO LTD (JP) 2016-06-16 US disclosed
US-9244346-B2 Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device TOKYO OHKA KOGYO CO., LTD. (JP) 2016-01-26 US disclosed
US-9244346-B2 Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device TOKYO OHKA KOGYO CO., LTD. (JP) 2016-01-26 US disclosed
US-20140231729-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2014-08-21 US disclosed
US-20140231729-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2014-08-21 US disclosed
EP-2725423-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE Tokyo Ohka Kogyo Co., Ltd. (JP) 2014-04-30 EP disclosed
EP-2725011-A1 NOVEL COMPOUND Tokyo Ohka Kogyo Co., Ltd. (JP) 2014-04-30 EP disclosed
WO-2012176694-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE 東京応化工業株式会社 (JP) 2012-12-27 WO disclosed
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2012-03-22 US disclosed
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2012-03-22 US disclosed
WO-2010113813-A1 BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION 大日本印刷株式会社 (JP) 2010-10-07 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME RER1, SUN2, REV1 PELI1 585/4885TRPV1 536/4885HPGD 861/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.