SCHEMBL3947426

SCHEMBL3947426

Nc1ccc(C(F)(F)c2ccc(N)c(O)c2)cc1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 4/20 0.50
ALOX15 P16050 4/20 0.50
CYP3A4 P08684 1/20 0.50
MEN1 O00255 3/20 0.45
KMT2A Q03164 3/20 0.45
GAA P10253 2/20 0.45
MAPT P10636 2/20 0.45
KDM4E B2RXH2 2/20 0.45
POLB P06746 1/20 0.45
RAB9A P51151 1/20 0.45
ALDH1A1 P00352 5/20 0.42
PKM P14618 2/20 0.42
RECQL P46063 1/20 0.42
ESR1 P03372 3/20 0.39
ESR2 Q92731 2/20 0.39
AR P10275 1/20 0.39
HPGD P15428 3/20 0.37
TSHR P16473 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
ALOX5AP P20292 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6856263 0.92 ALDH1A1 (0.55) HSD17B10ALOX15CYP3A4MEN1KMT2A
SCHEMBL1025296 0.86 ALDH1A1 (0.50) HSD17B10ALOX15CYP3A4MEN1KMT2A
SCHEMBL6823132 0.86 ALDH1A1 (0.50) HSD17B10ALOX15CYP3A4MEN1KMT2A
SCHEMBL29412586 0.83 ESR1 (0.50) HSD17B10ALOX15CYP3A4MEN1KMT2A
SCHEMBL5958751 0.83 HSD17B10 (0.46) HSD17B10ALOX15CYP3A4MEN1KMT2A
SCHEMBL23155928 0.83 ALDH1A1 (0.48) HSD17B10ALOX15CYP3A4MEN1KMT2A
SCHEMBL766058 0.83 ESR1 (0.50) HSD17B10ALOX15CYP3A4MEN1KMT2A
SCHEMBL29399630 0.83 ESR1 (0.50) HSD17B10ALOX15CYP3A4MEN1KMT2A
SCHEMBL1334041 0.82 ALDH1A1 (0.63) HSD17B10ALOX15MEN1KMT2AGAA
SCHEMBL11371728 0.81 SMN1; SMN2 (0.46) HSD17B10ALOX15CYP3A4MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11542397-B2 Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-03 US disclosed
US-20210309866-A1 LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LIGHT-EMITTING DISPLAY ELEMENT PANEL, AND LIGHT-EMITTING DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-10-07 US disclosed
EP-3812805-A1 LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LUMINESCENT DISPLAY ELEMENT PANEL, AND LUMINESCENT DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-04-28 EP disclosed
CN-112334795-A Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device 东京应化工业株式会社 2021-02-05 CN disclosed
CN-107429059-B Energy-sensitive resin composition 东京应化工业株式会社 2020-10-23 CN disclosed
CN-106575080-B Energy-sensitive resin composition 东京应化工业株式会社 2020-08-11 CN disclosed
US-10696845-B2 Energy-sensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-30 US disclosed
US-10570269-B2 Composition containing microparticles TOKYO OHKA KOGYO CO., LTD. (JP) 2020-02-25 US disclosed
EP-3275940-B1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2019-12-18 EP disclosed
CN-105579907-B Radiation-sensitive composition and pattern production method 东京应化工业株式会社 2019-12-17 CN disclosed
EP-2947112-A1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO., LTD. (JP) 2015-11-25 EP disclosed
EP-2695906-A1 POLYBENZOXAZOLE RESIN AND PRECURSOR THEREOF Mitsubishi Gas Chemical Company, Inc. (JP) 2014-02-12 EP disclosed
US-20130324662-A1 POLYBENZOXAZOLE RESIN AND PRECURSOR THEREOF MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-12-05 US disclosed
US-7560307-B2 Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-07-14 US disclosed
US-20060180908-A1 Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same YANO YASUHIRO 2006-08-17 US disclosed
US-7061081-B2 Comprises polyamideetherimide or polyether amide; for use as coating material, adhesive and stress releasing material; controlled elasticity; dielectrics; electronics HITACHI CHEMICAL CO., LTD. (JP) 2006-06-13 US disclosed
US-6780561-B2 FOR FORMING PROTECTIVE FILM OR AN INSULATING FILM FOR A SEMICONDUCTOR ELEMENT OR A CIRCUIT BOARD SUCH AS A PRINTED BOARD KANSAI PAINT CO., LTD. (JP) 2004-08-24 US disclosed
US-20040152862-A1 Optical resins and applications thereof HITACHI CHEMICAL CO., LTD. (JP) 2004-08-05 US disclosed
US-20030143480-A1 For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board KANSAI PAINT CO., LTD. (JP) 2003-07-31 US disclosed
US-20030082925-A1 Comprises polyamideetherimide or polyether amide; for use as coating material, adhesive and stress releasing material; controlled elasticity; dielectrics; electronics HITACHI CHEMICAL CO., LTD. (JP) 2003-05-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10570269-B2 Composition containing microparticles CHMP4B, EXOSC10, EXOSC9 HSD17B10 4476/4885ALOX15 2356/4885CYP3A4 2341/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.