SCHEMBL766471

SCHEMBL766471

C=Cc1ccccc1OC(=O)CCC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.48
MEN1 O00255 2/20 0.48
KDM4E B2RXH2 1/20 0.48
RECQL P46063 1/20 0.48
ALOX15 P16050 2/20 0.47
LMNA P02545 2/20 0.43
THRB P10828 2/20 0.40
THRA P10827 1/20 0.40
PTGS2 P35354 2/20 0.39
BCL9 O00512 1/20 0.39
CTNNB1 P35222 1/20 0.39
PTGDR2 Q9Y5Y4 1/20 0.38
ALDH1A1 P00352 2/20 0.38
POLM Q9NP87 1/20 0.38
POLK Q9UBT6 1/20 0.38
POLL Q9UGP5 1/20 0.38
POLH Q9Y253 1/20 0.38
USP2 O75604 1/20 0.38
NFE2L2 Q16236 1/20 0.37
PLIN1 O60240 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1908275 0.89 KDM4E (0.55) KMT2AMEN1KDM4ERECQLALOX15
SCHEMBL27579253 0.88 KDM4E (0.54) KMT2AMEN1KDM4ERECQLALOX15
SCHEMBL1397183 0.87 ALOX15 (0.44) KMT2AMEN1KDM4ERECQLALOX15
SCHEMBL1201154 0.87 ALDH1A1 (0.52) KMT2AMEN1KDM4ERECQLALOX15
SCHEMBL11620606 0.86 MEN1 (0.41) KMT2AMEN1KDM4ERECQLALOX15
SCHEMBL9312497 0.82 KMT2A (0.59) KMT2AMEN1KDM4ERECQLALOX15
SCHEMBL11044984 0.82 POLM (0.58) KMT2AMEN1KDM4ERECQLALOX15
SCHEMBL6743324 0.82 MEN1 (0.43) KMT2AMEN1KDM4ERECQLALOX15
SCHEMBL27573383 0.81 ALOX15 (0.48) KMT2AMEN1KDM4EALOX15LMNA
SCHEMBL17417576 0.81 PTGDR2 (0.41) KMT2AMEN1KDM4ELMNAPTGDR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4137137-A Radiation process for the production of graft copolymer to be used for ion-exchange membrane JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1979-01-30 US claimed
US-8835099-B2 Lithographic printing plate precursor EASTMAN KODAK COMPANY (US) 2014-09-16 US disclosed
US-8198007-B2 Negative-working resist composition and pattern forming method using the same DAI NIPPON PRINTING CO., LTD. (JP) 2012-06-12 US disclosed
US-20120070779-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR QUALEX INC. 2012-03-22 US disclosed
US-20100239980-A1 NEGATIVE-WORKING RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-4137137-A Radiation process for the production of graft copolymer to be used for ion-exchange membrane JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1979-01-30 US disclosed
US-4129617-A Fluoro carbon graft copolymer and process for the production thereof JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1978-12-12 US disclosed