SCHEMBL1397183

SCHEMBL1397183

C=Cc1ccccc1OC(=O)CC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.44
ELANE P08246 1/20 0.42
ESR1 P03372 2/20 0.40
HIF1A Q16665 2/20 0.40
PTGDR2 Q9Y5Y4 1/20 0.40
KMT2A Q03164 4/20 0.40
MEN1 O00255 2/20 0.40
RECQL P46063 2/20 0.40
ACHE P22303 2/20 0.40
KDM4E B2RXH2 2/20 0.40
THRA P10827 1/20 0.39
THRB P10828 1/20 0.39
USP2 O75604 1/20 0.39
NFE2L2 Q16236 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
ALDH1A1 P00352 2/20 0.39
HPGD P15428 1/20 0.39
HTT P42858 1/20 0.39
PLIN1 O60240 1/20 0.39
LMNA P02545 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL766471 0.87 KMT2A (0.48) ALOX15PTGDR2KMT2AMEN1RECQL
SCHEMBL1200995 0.86 ALDH1A1 (0.55) ALOX15ELANEESR1HIF1APTGDR2
SCHEMBL11619491 0.85 NFE2L2 (0.40) ALOX15ELANEESR1HIF1APTGDR2
SCHEMBL17417576 0.83 PTGDR2 (0.41) PTGDR2KMT2AMEN1KDM4EUSP2
SCHEMBL30634925 0.83 MEN1 (0.40) PTGDR2KMT2AMEN1KDM4ETHRA
SCHEMBL27573383 0.83 ALOX15 (0.48) ALOX15PTGDR2KMT2AMEN1KDM4E
SCHEMBL1908275 0.83 KDM4E (0.55) ALOX15KMT2AMEN1RECQLKDM4E
SCHEMBL1902239 0.83 PTGDR2 (0.40) PTGDR2KMT2AMEN1KDM4ENFE2L2
SCHEMBL27562951 0.83 PTGDR2 (0.40) PTGDR2KMT2AMEN1RECQLKDM4E
SCHEMBL27579253 0.82 KDM4E (0.54) ALOX15KMT2AMEN1RECQLKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118271496-A Isoalkenyl terpolymer containing oxygen polar groups and preparation method thereof 常州汉韦聚合物有限公司 2024-07-02 CN claimed
US-4137137-A Radiation process for the production of graft copolymer to be used for ion-exchange membrane JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1979-01-30 US claimed
CN-118271496-A Isoalkenyl terpolymer containing oxygen polar groups and preparation method thereof 常州汉韦聚合物有限公司 2024-07-02 CN disclosed
CN-117263778-A Preparation method of styrene series compound for 248nm photoresist 河北凯诺中星科技有限公司 2023-12-22 CN disclosed
CN-107207456-B Latent acids and their use 巴斯夫欧洲公司 2021-05-04 CN disclosed
EP-3253735-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2021-03-31 EP disclosed
US-10593980-B2 Ionomer resin, and ionomer solution, multilayer body, member, electrochemical element, and electrochemical device that include the same NITTO DENKO CORPORATION (JP) 2020-03-17 US disclosed
EP-2539316-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2019-10-23 EP disclosed
CN-108084331-B A kind of biology base film-forming resin and its photoresist of preparation 江南大学 2019-08-16 CN disclosed
US-9994538-B2 Latent acids and their use BASF SE (DE) 2018-06-12 US disclosed
US-20180050336-A1 ANION-EXCHANGE MEMBRANE, AND ELECTROCHEMICAL ELEMENT AND ELECTROCHEMICAL DEVICE HAVING SAME NITTO DENKO CORPORATION (JP) 2018-02-22 US disclosed
US-6512020-B1 Photosensitive acid-donors in chemically amplified resist formulations. activated by irradiation with actinic electromagnetic radiation and electron beams. CIBA SPECIALTY CHEMICALS CORPORATION 2003-01-28 US disclosed
WO-2002098870-A1 SUBSTITUTED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2002-12-12 WO disclosed
WO-2002046507-A2 ONIUM SALTS AND THE USE THEROF AS LATENT ACIDS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2002-06-13 WO disclosed
WO-2002025376-A2 OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2002-03-28 WO disclosed
US-20010036591-A1 Iodonium salts as latent acid donors IGM GROUP B.V. (NL) 2001-11-01 US disclosed
US-6306555-B1 RADIATION-SENSITIVE COMPOSITION COMPRISING CATIONICALLY OR ACID-CATALYTICALLY POLYMERISABLE OR CROSSLINKABLE COMPOUND OR COMPOUND THAT INCREASES ITS SOLUBILITY IN DEVELOPER UNDER ACTION OF ACID, AND AT LEAST ONE DIARYLIODONIUM SALT CIBA SPECIALTY CHEMICALS CORP. 2001-10-23 US disclosed
US-6261738-B1 LATENT CURING CATALYSTS FOR PHOTORESISTS SUCH AS 2,2,2-TRIFLUORO-1-PHENYL-ETHANONE OXIME-O-METHYL SULFONATE CIBA SPECIALTY CHEMICALS CORPORATION 2001-07-17 US disclosed
US-4137137-A Radiation process for the production of graft copolymer to be used for ion-exchange membrane JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1979-01-30 US disclosed
US-4129617-A Fluoro carbon graft copolymer and process for the production thereof JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1978-12-12 US disclosed