Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.54 |
| ▸ | CA1 | P00915 | 2/20 | 0.50 |
| ▸ | CA2 | P00918 | 2/20 | 0.50 |
| ▸ | MMP1 | P03956 | 1/20 | 0.50 |
| ▸ | MMP2 | P08253 | 1/20 | 0.50 |
| ▸ | MMP9 | P14780 | 1/20 | 0.50 |
| ▸ | MMP8 | P22894 | 1/20 | 0.50 |
| ▸ | MMP13 | P45452 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
| ▸ | CA3 | P07451 | 1/20 | 0.50 |
| ▸ | CA6 | P23280 | 1/20 | 0.50 |
| ▸ | CA5A | P35218 | 1/20 | 0.50 |
| ▸ | CA7 | P43166 | 1/20 | 0.50 |
| ▸ | CA9 | Q16790 | 1/20 | 0.50 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | POLB | P06746 | 2/20 | 0.48 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.48 |
| ▸ | HTT | P42858 | 2/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27914208 | 0.83 | GAA (0.56) | GAACA1CA2MMP1MMP2 | |
| SCHEMBL766980 | 0.81 | GAA (0.54) | GAACA1CA2MMP1MMP2 | |
| SCHEMBL11107252 | 0.81 | GAA (0.54) | GAACA1CA2MMP1MMP2 | |
| SCHEMBL179723 | 0.79 | ALDH1A1 (0.57) | GAACA1CA2MMP1MMP2 | |
| Zinc Ion SCHEMBL30498893 | 0.79 | GAA (0.52) | GAACA1CA2MMP1MMP2 | |
| SCHEMBL1334815 | 0.79 | GAA (0.52) | GAACA1CA2MMP1MMP2 | |
| SCHEMBL27962643 | 0.77 | ALDH1A1 (0.53) | GAACA1CA2MMP1MMP2 | |
| SCHEMBL2576334 | 0.76 | GAA (0.54) | GAACA1CA2MMP1MMP2 | |
| Bicarbonate SCHEMBL6755891 | 0.76 | SMN1; SMN2 (0.54) | GAACA1CA2MMP1MMP2 | |
| SCHEMBL12834934 | 0.76 | GAA (0.54) | GAACA1CA2MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 182 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-118159910-A | Additive-containing silicon-containing resist underlayer film forming composition | 日产化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-113518762-B | Release layer dispersion of layered compound and transparent substrate using the same | 公立大学法人大阪 | 2024-05-28 | — | — | CN | disclosed |
| US-20240162086-A1 | SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-05-16 | — | — | US | disclosed |
| CN-114341232-B | Process for producing silicon-containing polymer composition | 日产化学株式会社 | 2024-05-07 | — | — | CN | disclosed |
| CN-117940850-A | Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| US-11966164-B2 | Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| US-11961636-B2 | Silica-containing insulating composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-16 | — | — | US | disclosed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| US-20110287369-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ANION GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-11-24 | — | — | US | disclosed |
| EP-2372458-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMATION COMPOSITION HAVING ANION GROUP | Nissan Chemical Industries, Ltd. (JP) | 2011-10-05 | — | — | EP | disclosed |
| EP-2336256-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM WITH ONIUM GROUP | Nissan Chemical Industries, Ltd. (JP) | 2011-06-22 | — | — | EP | disclosed |
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110073977-A1 | AMINO ACID GENERATOR AND POLYSILOXANE COMPOSITION CONTAINING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20100330505-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING CYCLIC AMINO GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100304305-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING POLYMER HAVING NITROGEN-CONTAINING SILYL GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100291487-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING UREA GROUP | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| EP-2249204-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CYCLIC AMINO GROUP | Nissan Chemical Industries, Ltd. (JP) | 2010-11-10 | — | — | EP | disclosed |
| EP-2196854-A1 | COMPOSITION CONTAINING POLYMER HAVING NITROGENOUS SILYL GROUP FOR FORMING RESIST UNDERLAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2010-06-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | SRR, KDM2B, MSR1 | GAA 1407/4885CA1 1050/4885CA2 1721/4885 |
| US-20110073977-A1 | AMINO ACID GENERATOR AND POLYSILOXANE COMPOSITION CONTAINING THE SAME | DAO, BCAT1, BCAT2 | GAA 2047/4885CA1 69/4885CA2 2203/4885 |
| US-20110287369-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ANION GROUP | SIK2, SRRM2, SRSF7 | GAA 2059/4885CA1 58/4885CA2 74/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.