Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.51 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | GAA | P10253 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 3/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | MITF | O75030 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | CCR6 | P51684 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | APEX1 | P27695 | 8/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL767170 | 1.00 | KDM4E (0.51) | KDM4EAKR1C3ALDH1A1GAAMEN1 | |
| SCHEMBL1521190 | 0.86 | KDM4E (0.50) | KDM4EALDH1A1GAAMEN1KMT2A | |
| SCHEMBL819646 | 0.85 | KDM4E (0.68) | KDM4EAKR1C3ALDH1A1GAAMEN1 | |
| SCHEMBL36974 | 0.85 | KDM4E (0.68) | KDM4EAKR1C3ALDH1A1GAAMEN1 | |
| SCHEMBL909620 | 0.83 | MTNR1A (0.44) | KDM4EALDH1A1GAAMEN1KMT2A | |
| SCHEMBL8746662 | 0.83 | AKR1C3 (0.59) | KDM4EAKR1C3ALDH1A1CYP2C9HPGD | |
| SCHEMBL8746663 | 0.81 | AKR1C3 (0.50) | KDM4EAKR1C3ALDH1A1GAAMEN1 | |
| SCHEMBL8746683 | 0.81 | AKR1C3 (0.50) | KDM4EAKR1C3ALDH1A1GAAMEN1 | |
| SCHEMBL11142704 | 0.81 | AKR1C3 (0.55) | KDM4EAKR1C3ALDH1A1GAAMEN1 | |
| SCHEMBL8746664 | 0.81 | AKR1C3 (0.55) | KDM4EAKR1C3ALDH1A1GAAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2404940-B1 | Method for producing polymer composition and polymer composition | INCTEC INC (JP) | 2014-12-24 | — | — | EP | claimed |
| US-6870180-B2 | Organic polarizable gate transistor apparatus and method | LUCENT TECHNOLOGIES INC. (US) | 2005-03-22 | — | — | US | claimed |
| US-20020195644-A1 | Organic polarizable gate transistor apparatus and method | ALCATEL-LUCENT USA INC. | 2002-12-26 | — | — | US | claimed |
| US-6455416-B1 | Developer soluble dyed BARC for dual damascene process | ADVANCED MICRO DEVICES, INC. | 2002-09-24 | — | — | US | claimed |
| US-11392037-B2 | Resist underlayer film forming composition containing silicone having cyclic amino group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-07-19 | — | — | US | disclosed |
| US-11205778-B2 | Conductive polymer emulsion | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2021-12-21 | — | — | US | disclosed |
| US-20200395614-A1 | CONDUCTIVE POLYMER EMULSION | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2020-12-17 | — | — | US | disclosed |
| EP-3193398-B1 | CONDUCTIVE PASTE FOR LITHIUM-ION BATTERY POSITIVE ELECTRODES AND MIXTURE PASTE FOR LITHIUM-ION BATTERY POSITIVE ELECTRODES | KANSAI PAINT CO LTD (JP) | 2020-07-08 | — | — | EP | disclosed |
| US-10355281-B2 | Conductive paste for lithium-ion battery positive electrodes and mixture paste for lithium-ion battery positive electrodes | KANSAI PAINT CO., LTD. (JP) | 2019-07-16 | — | — | US | disclosed |
| US-10256472-B2 | Conductive paste and mixture paste for lithium ion battery positive electrode | KANSAI PAINT CO., LTD. (JP) | 2019-04-09 | — | — | US | disclosed |
| EP-3168904-B1 | CONDUCTIVE PASTE AND MIXTURE PASTE FOR LITHIUM ION BATTERY POSITIVE ELECTRODE | KANSAI PAINT CO LTD (JP) | 2019-03-13 | — | — | EP | disclosed |
| EP-3088482-B1 | INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND METHOD FOR PRODUCING PRINTED MATERIAL | DNP FINE CHEMICALS CO LTD (JP) | 2018-11-07 | — | — | EP | disclosed |
| US-6534243-B1 | A coating containing a cleaving compound to trim resist features; permitting a deprotection region to form within an inner portion of the patterned resist; removing coating and deprotection region to provide a second patterned feature | ADVANCED MICRO DEVICES, INC. | 2003-03-18 | — | — | US | disclosed |
| US-20030027060-A1 | Photoresist and process for structuring such a photoresist | LEDERER KAY (DE) | 2003-02-06 | — | — | US | disclosed |
| US-20020195644-A1 | Organic polarizable gate transistor apparatus and method | ALCATEL-LUCENT USA INC. | 2002-12-26 | — | — | US | disclosed |
| US-6492075-B1 | COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST | ADVANCED MICRO DEVICES, INC. | 2002-12-10 | — | — | US | disclosed |
| US-6455416-B1 | Developer soluble dyed BARC for dual damascene process | ADVANCED MICRO DEVICES, INC. | 2002-09-24 | — | — | US | disclosed |
| US-6274289-B1 | Chemical resist thickness reduction process | ADVANCED MICRO DEVICES, INC. | 2001-08-14 | — | — | US | disclosed |
| EP-0480314-B1 | Polyoxymethylene moulding compositions having an increased thermal stability and a reduced emission of formaldehyde | DEGUSSA (DE) | 1996-06-05 | — | — | EP | disclosed |
| EP-0480314-A2 | Polyoxymethylene moulding compositions having an increased thermal stability and a reduced emission of formaldehyde | DEGUSSA AG (DE) | 1992-04-15 | — | — | EP | disclosed |