Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 3/20 | 0.44 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | MITF | O75030 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | CCR6 | P51684 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | CDC25B | P30305 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3826539 | 0.86 | KDM4E (0.55) | MTNR1AMTNR1BKDM4EALDH1A1GAA | |
| SCHEMBL767170 | 0.83 | KDM4E (0.51) | MTNR1AMTNR1BKDM4EALDH1A1GAA | |
| SCHEMBL767171 | 0.83 | KDM4E (0.51) | MTNR1AMTNR1BKDM4EALDH1A1GAA | |
| SCHEMBL28989933 | 0.82 | KDM4E (0.40) | MTNR1AMTNR1BKDM4EALDH1A1GAA | |
| SCHEMBL1521190 | 0.82 | KDM4E (0.50) | MTNR1AMTNR1BKDM4EALDH1A1GAA | |
| SCHEMBL28989628 | 0.81 | KDM4E (0.47) | MTNR1AMTNR1BKDM4EALDH1A1GAA | |
| SCHEMBL28445122 | 0.81 | MAOB (0.43) | MTNR1AMTNR1BKDM4EALDH1A1NPSR1 | |
| SCHEMBL3165817 | 0.80 | KDM4E (0.52) | MTNR1AMTNR1BKDM4EALDH1A1GAA | |
| SCHEMBL28130415 | 0.79 | ALDH1A1 (0.42) | MTNR1AMTNR1BKDM4EALDH1A1GAA | |
| SCHEMBL28989649 | 0.78 | MTNR1A (0.44) | MTNR1AMTNR1BKDM4EALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117866135-A | Self-crosslinking polymer and bottom anti-reflection coating composition as well as preparation method and application thereof | 厦门恒坤新材料科技股份有限公司 | 2024-04-12 | — | — | CN | claimed |
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| CN-119866360-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2025-04-22 | — | — | CN | disclosed |
| CN-119856108-A | Liquid crystal aligning agent and liquid crystal display element | 日产化学株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-119768742-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-119768473-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| US-20250109325-A1 | RELEASABILITY-IMPARTING AGENT, ADHESIVE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| CN-116323702-B | Method for producing single-layer phase difference material | 日产化学株式会社 | 2025-04-01 | — | — | CN | disclosed |
| CN-111492312-B | Composition for forming protective film having glycol structure | 日产化学株式会社 | 2025-03-18 | — | — | CN | disclosed |
| CN-119604817-A | Positive photosensitive resin composition | 日产化学株式会社 | 2025-03-11 | — | — | CN | disclosed |
| US-20070148586-A1 | Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same | CHEIL INDUSTRIES, INC. (KR) | 2007-06-28 | — | — | US | disclosed |
| CN-1936708-A | Antireflective hard mask compositions | ROHM & HAAS ELECT MAT (US) | 2007-03-28 | — | — | CN | disclosed |
| CN-1900824-A | Coating compositions for use with an overcoated photoresist | ROHM & HAAS ELECT MAT (US) | 2007-01-24 | — | — | CN | disclosed |
| CN-1847982-A | Coating compositions for use with an overcoated photoresist | ROHM & HAAS ELECT MAT (US) | 2006-10-18 | — | — | CN | disclosed |
| US-6887648-B2 | Antireflective coating compositions | SHIPLEY COMPANY, L.L.C. (US) | 2005-05-03 | — | — | US | disclosed |
| US-20040219453-A1 | Antireflective coating compositions | SHIPLEY COMPANY, L.L.C. | 2004-11-04 | — | — | US | disclosed |
| US-6767689-B2 | Antireflective coating compositions | SHIPLEY COMPANY, L.L.C. | 2004-07-27 | — | — | US | disclosed |
| CN-1482192-A | Coating compositions for use with an overcoated photoresist | 希普雷公司 | 2004-03-17 | — | — | CN | disclosed |
| US-20030008237-A1 | Antireflective coating compositions | SHIPLEY COMPANY, L.L.C. | 2003-01-09 | — | — | US | disclosed |
| EP-1262831-A2 | Antireflective coating compositions | Shipley Co. L.L.C. (US) | 2002-12-04 | — | — | EP | disclosed |