SCHEMBL7696734

SCHEMBL7696734

CCC(C)[CH]Oc1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.39
LTA4H P09960 3/20 0.36
MAOA P21397 1/20 0.36
PTGS1 P23219 1/20 0.36
CA4 P22748 1/20 0.36
TSHR P16473 1/20 0.33
TRPA1 O75762 1/20 0.33
CHRNB2 P17787 1/20 0.33
CHRNB4 P30926 1/20 0.33
CHRNA3 P32297 1/20 0.33
CHRNA7 P36544 1/20 0.33
CHRNA4 P43681 1/20 0.33
RELA Q04206 1/20 0.33
KCNA3 P22001 1/20 0.33
NPY5R Q15761 1/20 0.33
MTNR1A P48039 3/20 0.33
MTNR1B P49286 3/20 0.33
ADRB2 P07550 1/20 0.33
ADRB1 P08588 1/20 0.33
CYP2D6 P10635 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1042354 0.78 CA4 (0.42) LMNALTA4HMAOAPTGS1CA4
SCHEMBL27665973 0.75 PPARG (0.37) LMNALTA4HCA4
SCHEMBL8211743 0.74 CA4 (0.39) LMNALTA4HMAOAPTGS1CA4
SCHEMBL1262500 0.74 LMNA (0.47) LMNALTA4HMAOAPTGS1CA4
SCHEMBL10864762 0.71 POLB (0.36) LMNALTA4HCA4
SCHEMBL13950399 0.71 HPGD (0.37) LMNALTA4HMAOAPTGS1CA4
SCHEMBL98246 0.69 CA4 (0.42) LMNALTA4HCA4TSHRCHRNB2
Formic Acid Phenyl Ester SCHEMBL27821335 0.68 ALDH1A1 (0.45) LMNATSHRTRPA1
SCHEMBL27931953 0.68 LTA4H (0.41) LMNALTA4HMAOATSHRADRB2
SCHEMBL13950398 0.68 LTA4H (0.38) LMNALTA4HCA4TSHRCHRNB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6344307-B1 RESIN HAVING AT LEAST ONE APROTIC AMMONIUM, PHOSPHONIUM OR SULFONIUM SALT; COMPOUND HAVING TWO OR MORE VINYLETHER GROUPS IN A MOLECULE; AND COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC ENERGY RAYS KANSAI PAINT CO., LTD. (JP) 2002-02-05 US disclosed