SCHEMBL7698928

SCHEMBL7698928

CCO[Si]1(OCC)CCC(c2ccccc2)(c2ccccc2)O[Si]1(c1ccccc1)c1ccccc1

nearest known ligand 0.34

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.33
OPRM1 P35372 9/20 0.32
OPRK1 P41145 7/20 0.32
OPRD1 P41143 6/20 0.32
OPRL1 P41146 4/20 0.32
SLC22A1 O15245 1/20 0.31
SLC6A4 P31645 1/20 0.31
ADRA1A P35348 1/20 0.31
KCNH2 Q12809 1/20 0.31
LMNA P02545 1/20 0.30
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7691820 0.90 OPRM1 (0.33) SMN1; SMN2OPRM1OPRK1OPRD1OPRL1
SCHEMBL7700692 0.88 CYP2C9 (0.40) SMN1; SMN2OPRM1OPRK1OPRD1OPRL1
SCHEMBL6905831 0.87 SMN1; SMN2 (0.32) SMN1; SMN2OPRM1OPRK1OPRD1OPRL1
SCHEMBL7697446 0.84 OPRM1 (0.32) OPRM1OPRK1OPRL1
SCHEMBL7695712 0.80 ADRA1A (0.32) ADRA1A
SCHEMBL28453987 0.78 SMN1; SMN2 (0.31) SMN1; SMN2OPRM1
SCHEMBL2786782 0.78 OPRM1 (0.33) OPRM1OPRK1OPRL1
SCHEMBL18094243 0.76 SMN1; SMN2 (0.33) SMN1; SMN2OPRM1OPRK1OPRD1OPRL1
SCHEMBL28337858 0.76 OPRM1 (0.31) OPRM1OPRK1OPRL1
SCHEMBL1538777 0.75 MAOA (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106243357-B It can the siliceous anti-reflection agent peelled off of wet type 罗门哈斯电子材料有限责任公司 2019-07-23 CN disclosed
US-10031420-B2 Wet-strippable silicon-containing antireflectant ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-07-24 US disclosed
CN-106243357-A Can the siliceous anti-reflection agent peelled off of wet type 罗门哈斯电子材料有限责任公司 2016-12-21 CN disclosed
US-20160363861-A1 WET-STRIPPABLE SILICON-CONTAINING ANTIREFLECTANT ROHM AND HAAS ELECTRONIC MATERIALS LLC 2016-12-15 US disclosed
US-9442377-B1 Wet-strippable silicon-containing antireflectant ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-09-13 US disclosed
US-6344579-B1 REACTION OF FLUOROSILICON COMPOUND WITH REACTION OF SILICON WITH HYDROXY, ALKOXY OR ARYLOXY GROUP WITH DIFLUORODIAMINO COMPOUND MITSUI CHEMICALS, INC. (JP) 2002-02-05 US disclosed
EP-1138633-A1 PROCESS FOR PRODUCING FLUORINATED SILICON COMPOUND Mitsui Chemicals, Inc. (JP) 2001-10-04 EP disclosed