SCHEMBL7702002

SCHEMBL7702002

N#COc1ccc(C(F)(C(F)F)C(F)(F)F)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6760780 0.79
SCHEMBL7647444 0.78 ESR1 (0.35)
SCHEMBL24990 0.77 ESR1 (0.45)
SCHEMBL10627367 0.77 KIF11 (0.33)
SCHEMBL4376536 0.77 KIF11 (0.47)
SCHEMBL29038972 0.76 KIF11 (0.52)
Hydrogen Sulfide SCHEMBL28175895 0.75 KIF11 (0.45)
SCHEMBL28868994 0.74
SCHEMBL8426309 0.73 AR (0.46)
SCHEMBL28868996 0.73 AR (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107502277-B High-toughness cyanate ester adhesive 中国科学院化学研究所 2020-02-21 CN claimed
CN-107474534-B Preparation method of cyanate foamed plastic 中国科学院化学研究所 2020-02-21 CN claimed
CN-107400496-B Silazane hybrid cyanate adhesive 中国科学院化学研究所 2020-02-18 CN claimed
CN-115175951-B Resin composition, cured product, prepreg, metal foil-clad laminate, resin sheet, and printed wiring board 三菱瓦斯化学株式会社 2024-07-12 CN disclosed
CN-117321091-B Maleimide resin, amine resin, curable resin composition, and cured product thereof 日本化药株式会社 2024-06-04 CN disclosed
CN-118139906-A Phenol resin, epoxy resin, curable resin composition, and cured product thereof 日本化药株式会社 2024-06-04 CN disclosed
CN-118043384-A Prepreg, laminate and printed circuit board 三菱瓦斯化学株式会社 2024-05-14 CN disclosed
CN-113260646-B Aromatic amine resin, maleimide resin, curable resin composition, and cured product thereof 日本化药株式会社 2024-04-02 CN disclosed
CN-117529508-A Amine compound, maleimide compound, curable resin composition, and cured product thereof 日本化药株式会社 2024-02-06 CN disclosed
CN-117529509-A Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device 三菱瓦斯化学株式会社 2024-02-06 CN disclosed
CN-117500850-A Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device 三菱瓦斯化学株式会社 2024-02-02 CN disclosed
CN-108779330-A Resin combination, prepreg, clad with metal foil plywood, resin sheet and printed circuit board 三菱瓦斯化学株式会社 2018-11-09 CN disclosed
EP-1198724-A1 OPTICAL WAVEGUIDES DERIVED FROM A COMBINATION OF POLY(PERFLUOROCYCLOBUTANES) AND POLYMERIC CYANATES PIRELLI CAVI E SISTEMI S.p.A. (IT) 2002-04-24 EP disclosed
EP-1196477-A1 POLYCYANATE COPOLYMERS PREPARED FROM POLYFUNCTIONAL CYANATES AND FLUORINATED MONOCYANATES, AND OPTICAL ELEMENTS PREPARED THEREFROM Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 2002-04-17 EP disclosed
EP-1194795-A1 THERMOSETTING PLASTICS AS SUBSTRATE MATERIALS FOR OPTICAL SYSTEMS Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 2002-04-10 EP disclosed
WO-2001002465-A1 POLYCYANATE COPOLYMERS PREPARED FROM POLYFUNCTIONAL CYANATES AND FLUORINATED MONOCYANATES, AND OPTICAL ELEMENTS PREPARED THEREFROM Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 2001-01-11 WO disclosed
WO-2001002878-A1 THERMOSETTING PLASTICS AS SUBSTRATE MATERIALS FOR OPTICAL SYSTEMS Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 2001-01-11 WO disclosed
WO-2001002880-A1 OPTICAL WAVEGUIDES DERIVED FROM A COMBINATION OF POLY(PERFLUOROCYCLOBUTANES) AND POLYMERIC CYANATES PIRELLI CAVI E SISTEMI S.P.A. (IT) 2001-01-11 WO disclosed
US-5605781-A Photosensitive composition with cyanate esters and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1997-02-25 US disclosed
US-5464726-A Making resist image by exposing positive photosensitive composition /cyanate ester and cationic photoinitiator generating Bronsted acid upon exposure to actinic light/ in predetermined pattern to actinic light, heating, developing INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1995-11-07 US disclosed