Potassium Ion

Potassium Ion

SCHEMBL7708318

O[Si](O)(O)O.[K+].[Li+].[O-][Si]([O-])(O)O

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL224328 0.94
Potassium Ion SCHEMBL9297905 0.94
Potassium Ion SCHEMBL8019002 0.94
Lithium Ion SCHEMBL18286122 0.94
Lithium Ion SCHEMBL16398444 0.89
Lithium Ion SCHEMBL16927417 0.89
Potassium Ion SCHEMBL2946727 0.89 CA4 (0.31)
Potassium Ion SCHEMBL2952881 0.88
Lithium Ion SCHEMBL9395897 0.88
Potassium Ion SCHEMBL7754143 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11554994-B2 Stabilized refractory compositions ALLIED MINERAL PRODUCTS, LLC (US) 2023-01-17 US claimed
CN-102923723-A Novel aerosol material and preparation method, application and application structure thereof SHAANXI UNITA NM NEW MATERIAL CO LTD 2013-02-13 CN claimed
US-6358365-B1 Metal silicates, cellulose products, and processes thereof HERCULES INCORPORATED 2002-03-19 US claimed
EP-0492959-B1 Method for developing presensitized plate for use in making lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 1999-02-24 EP claimed
CN-110016245-B Thermal shock resistant industrial coating 平顶山学院 2021-08-27 CN disclosed
CN-109695332-B Dry type hot water heating floor 温州乐成装饰设计有限公司 2021-01-01 CN disclosed
CN-102923723-A Novel aerosol material and preparation method, application and application structure thereof SHAANXI UNITA NM NEW MATERIAL CO LTD 2013-02-13 CN disclosed
CN-1654133-A Stainproof material and method for manufacturing the same, and coating composition and apparatus therefor TOTO LTD (JP) 2005-08-17 CN disclosed
CN-1198886-C Antifouling material, process for producing the same, and coating composition and apparatus for use in the process TOTO LTD (JP) 2005-04-27 CN disclosed
CN-1330692-A Antifouling material, process for producing the same, and coating composition and apparatus for use in the process TOTO LTD (JP) 2002-01-09 CN disclosed
US-5055137-A Aqueous mixture of lithium and potassium silicates ZYP COATINGS, INC. (US) 1991-10-08 US disclosed