Anthranilic Acid

Anthranilic Acid

SCHEMBL7721994

C=C(C)C(=O)OC(C(=O)C(=C)C)(C(=O)C(=C)C)C(CO)(CO)CO.Nc1ccccc1C(=O)O

nearest known ligand 0.38

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 13/20 0.38
HSD17B10 Q99714 10/20 0.38
CFTR P13569 1/20 0.37
TSHR P16473 3/20 0.35
KDM4E B2RXH2 9/20 0.35
NPC1 O15118 3/20 0.35
RAB9A P51151 3/20 0.35
CASP3 P42574 1/20 0.35
SENP8 Q96LD8 1/20 0.35
SENP7 Q9BQF6 1/20 0.35
SENP6 Q9GZR1 1/20 0.35
MAPT P10636 2/20 0.35
GAA P10253 1/20 0.35
MMP2 P08253 1/20 0.35
HPGD P15428 5/20 0.35
SMN1; SMN2 Q16637 3/20 0.35
TDP1 Q9NUW8 2/20 0.35
GLA P06280 2/20 0.35
TP53 P04637 1/20 0.35
CYP3A4 P08684 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anthranilic Acid SCHEMBL8018582 0.84 HSD17B10 (0.32) ALDH1A1HSD17B10CFTRTSHRKDM4E
SCHEMBL7721993 0.84 ALDH1A1 (0.47) ALDH1A1HSD17B10CFTRTSHRKDM4E
Aminobenzoic Acid SCHEMBL6802563 0.81 HTT (0.40) ALDH1A1HSD17B10TSHRKDM4ENPC1
3-Aminobenzoic Acid SCHEMBL8361933 0.81
Anthranilic Acid SCHEMBL8018584 0.80
3-Aminobenzoic Acid SCHEMBL7728826 0.80 PBRM1 (0.38) ALDH1A1KDM4ENPC1RAB9AMAPT
SCHEMBL8362090 0.79 ALDH1A1 (0.38) ALDH1A1TSHR
Anthranilic Acid SCHEMBL7730694 0.78 HSD17B10 (0.40) ALDH1A1HSD17B10CFTRTSHRKDM4E
Anthranilic Acid SCHEMBL7730700 0.75 HSD17B10 (0.38) ALDH1A1HSD17B10CFTRTSHRKDM4E
SCHEMBL8362150 0.74 ALDH1A1 (0.44) ALDH1A1HSD17B10TSHRNPC1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US claimed
US-6403289-B1 ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 2002-06-11 US disclosed
US-6160081-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 2000-12-12 US disclosed
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US disclosed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US disclosed
EP-0702270-A2 Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1996-03-20 EP disclosed