3-Aminobenzoic Acid

3-Aminobenzoic Acid

SCHEMBL7728826

C=C(C)C(=O)OC(C(=O)C(=C)C)(C(=O)C(=C)C)C(CO)(CO)CO.Nc1cccc(C(=O)O)c1

nearest known ligand 0.38

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PBRM1 Q86U86 1/20 0.38
ALDH1A1 P00352 2/20 0.36
KDM4E B2RXH2 1/20 0.36
POLB P06746 2/20 0.35
APEX1 P27695 1/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
LMNA P02545 2/20 0.34
NPC1 O15118 1/20 0.34
MITF O75030 1/20 0.34
ADRB2 P07550 2/20 0.34
ADRB1 P08588 2/20 0.34
ADRB3 P13945 2/20 0.34
KMT2A Q03164 2/20 0.33
ELANE P08246 1/20 0.33
NOS3 P29474 2/20 0.33
NOS1 P29475 2/20 0.33
NOS2 P35228 2/20 0.33
MAPT P10636 1/20 0.33
KIF11 P52732 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Aminobenzoic Acid SCHEMBL6802563 0.85 HTT (0.40) ALDH1A1KDM4EPOLBAPEX1HTT
SCHEMBL7728821 0.85 ADRB2 (0.41) PBRM1ALDH1A1KDM4EPOLBLMNA
3-Aminobenzoic Acid SCHEMBL7728353 0.85 PBRM1 (0.32) PBRM1ALDH1A1KDM4EPOLBAPEX1
3-Aminobenzoic Acid SCHEMBL8361933 0.84
Anthranilic Acid SCHEMBL7721994 0.80 ALDH1A1 (0.38) ALDH1A1KDM4EPOLBTDP1NPC1
SCHEMBL7733535 0.79 NPC1 (0.32) POLBAPEX1HTTTDP1NPC1
SCHEMBL8362090 0.76 ALDH1A1 (0.38) ALDH1A1
4-Nitrobenzoic Acid SCHEMBL6806184 0.74 TDP1 (0.49) ALDH1A1POLBAPEX1HTTTDP1
3-Aminobenzoic Acid SCHEMBL7726622 0.74 PBRM1 (0.38) PBRM1ALDH1A1KDM4EPOLBLMNA
SCHEMBL8578226 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US claimed
US-6403289-B1 ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 2002-06-11 US disclosed
US-6160081-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 2000-12-12 US disclosed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US disclosed
EP-0702270-A2 Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1996-03-20 EP disclosed