Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | APEX1 | P27695 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | MAOA | P21397 | 1/20 | 0.34 |
| ▸ | ELANE | P08246 | 1/20 | 0.33 |
| ▸ | NOS1 | P29475 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 3/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 3-Aminobenzoic Acid SCHEMBL7728826 | 0.85 | PBRM1 (0.38) | HTTPOLBAPEX1TDP1LMNA | |
| Aminobenzoic Acid SCHEMBL7721636 | 0.84 | POLB (0.35) | HTTPOLBAPEX1TDP1 | |
| SCHEMBL6802558 | 0.84 | LMNA (0.43) | HTTPOLBAPEX1TDP1CYP1A2 | |
| 4-Nitrobenzoic Acid SCHEMBL6806184 | 0.83 | TDP1 (0.49) | HTTPOLBAPEX1TDP1KMT2A | |
| SCHEMBL8578226 | 0.82 | — | — | |
| SCHEMBL8362150 | 0.82 | ALDH1A1 (0.44) | TDP1TSHRCYP2C19NPC1ALDH1A1 | |
| Anthranilic Acid SCHEMBL7721994 | 0.81 | ALDH1A1 (0.38) | POLBTDP1CYP3A4ELANEKMT2A | |
| SCHEMBL8362090 | 0.80 | ALDH1A1 (0.38) | TSHRALDH1A1THRB | |
| Aminobenzoic Acid SCHEMBL7721641 | 0.80 | POLB (0.32) | HTTPOLBAPEX1TDP1 | |
| SCHEMBL7733535 | 0.78 | NPC1 (0.32) | HTTPOLBAPEX1TDP1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | claimed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | claimed |
| EP-0702270-A2 | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1996-03-20 | — | — | EP | claimed |
| US-6743851-B2 | MIXTURE CONTAINING TETRAZOLE | NIPPON ZEON CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-6734248-B2 | CONTAINING A 1H-TETRAZOLE OR A 5,5'-BIS-1H-TETRAZOLE | NIPPON ZEON CO., LTD. (JP) | 2004-05-11 | — | — | US | disclosed |
| EP-0822229-B1 | POLYIMIDE RESIN COMPOSITION | NIPPON ZEON CO (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-6403289-B1 | ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS | NIPPON ZEON CO., LTD. (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020035196-A1 | Polyimide film | TANAKA AKIRA (JP) | 2002-03-21 | — | — | US | disclosed |
| US-20020032273-A1 | Pattern forming process using polyimide resin composition | TANAKA AKIRA (JP) | 2002-03-14 | — | — | US | disclosed |
| US-6310135-B1 | PHOTOSENSITIVE RESINS WITH TETRAZOLE COMPOUND | NIPPON ZEON CO., LTD. (JP) | 2001-10-30 | — | — | US | disclosed |
| US-6160081-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | disclosed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | disclosed |
| EP-0822229-A1 | POLYIMIDE RESIN COMPOSITION | NIPPON ZEON CO., LTD. (JP) | 1998-02-04 | — | — | EP | disclosed |
| EP-0702270-A2 | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |