SCHEMBL7721993

SCHEMBL7721993

C=C(C)C(=O)OC(C(=O)C(=C)C)(C(=O)C(=C)C)C(CO)(CO)COC(=O)c1ccccc1N

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 12/20 0.47
HSD17B10 Q99714 9/20 0.47
TSHR P16473 7/20 0.44
KDM4E B2RXH2 5/20 0.41
POLB P06746 2/20 0.41
RAB9A P51151 3/20 0.40
HPGD P15428 3/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
NPC1 O15118 2/20 0.40
GLA P06280 2/20 0.40
CYP3A4 P08684 2/20 0.40
TDP1 Q9NUW8 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
CFTR P13569 1/20 0.40
TP53 P04637 1/20 0.40
MAPK1 P28482 1/20 0.40
HIF1A Q16665 1/20 0.40
MEN1 O00255 1/20 0.40
NFKB1 P19838 1/20 0.40
NFKB2 Q00653 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anthranilic Acid SCHEMBL7721994 0.84 ALDH1A1 (0.38) ALDH1A1HSD17B10TSHRKDM4EPOLB
SCHEMBL6802558 0.82 LMNA (0.43) ALDH1A1TSHRPOLBRAB9ANPC1
SCHEMBL7728821 0.81 ADRB2 (0.41) ALDH1A1KDM4EPOLBRAB9ANPC1
SCHEMBL7728930 0.74 ALDH1A1 (0.50) ALDH1A1HSD17B10TSHRKDM4EPOLB
SCHEMBL31533511 0.74 ALDH1A1 (0.61) ALDH1A1HSD17B10TSHRKDM4EPOLB
SCHEMBL6806182 0.74 ADRB2 (0.42) ALDH1A1KDM4EPOLBHPGDSMN1; SMN2
SCHEMBL7733535 0.74 NPC1 (0.32) POLBNPC1TDP1
SCHEMBL8578222 0.74
SCHEMBL27876281 0.73 TSHR (0.45) ALDH1A1HSD17B10TSHRNPC1CYP3A4
SCHEMBL8362090 0.73 ALDH1A1 (0.38) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US claimed
US-6403289-B1 ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 2002-06-11 US disclosed
US-6160081-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 2000-12-12 US disclosed
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US disclosed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US disclosed
EP-0702270-A2 Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1996-03-20 EP disclosed