SCHEMBL7723639

SCHEMBL7723639

CCOCCN(C)c1ccccc1N(C)CCOCC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.37
USP2 O75604 1/20 0.35
SLC6A4 P31645 4/20 0.35
TSHR P16473 2/20 0.35
THRA P10827 1/20 0.34
KDM4E B2RXH2 3/20 0.33
ALDH1A1 P00352 3/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
ADRB2 P07550 1/20 0.33
ADRB1 P08588 1/20 0.33
NAMPT P43490 1/20 0.33
LMNA P02545 2/20 0.32
CYP1A2 P05177 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
CHRM5 P08912 1/20 0.32
ADRA2A P08913 1/20 0.32
CYP2D6 P10635 1/20 0.32
CHRM1 P11229 1/20 0.32
ADRA2B P18089 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14350994 0.87 ALDH1A1 (0.39) ALOX15USP2SLC6A4TSHRTHRA
SCHEMBL1637985 0.82 ALOX15 (0.43) ALOX15USP2TSHRALDH1A1SMN1; SMN2
SCHEMBL7734454 0.79 ALDH1A1 (0.34) USP2SLC6A4TSHRKDM4EALDH1A1
SCHEMBL7733730 0.78 KMT2A (0.42) SLC6A4TSHRKDM4EALDH1A1LMNA
SCHEMBL7731818 0.78 MYC (0.36) ALOX15TSHRKDM4EALDH1A1SMN1; SMN2
SCHEMBL6883554 0.77 ALDH1A1 (0.36) KDM4EALDH1A1SMN1; SMN2HTTESR1
SCHEMBL9762466 0.75 ESR1 (0.40) ALOX15TSHRKDM4EALDH1A1LMNA
SCHEMBL13662531 0.74 CYP2C19 (0.49) SLC6A4TSHRKDM4EALDH1A1SMN1; SMN2
SCHEMBL7731805 0.73 CHRM2 (0.37) SLC6A4TSHRKDM4EALDH1A1SMN1; SMN2
SCHEMBL2572167 0.71 ALOX15 (0.44) ALOX15TSHRALDH1A1SMN1; SMN2NAMPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6399272-B1 Phenylenediamine derivative-type additive useful for a chemically amplified photoresist HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-06-04 US disclosed