Anthranilic Acid

Anthranilic Acid

SCHEMBL7728640

C=CC(=O)OC(C(=O)C=C)(C(=O)C=C)C(CO)(CO)C(O)(C(=O)C=C)C(=O)C=C.Nc1ccccc1C(=O)O.OCC(CO)(CO)CO

nearest known ligand 0.36

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.36
HSD17B10 Q99714 5/20 0.36
TSHR P16473 2/20 0.36
MAPT P10636 2/20 0.33
GAA P10253 1/20 0.33
KDM4E B2RXH2 3/20 0.32
SMN1; SMN2 Q16637 3/20 0.31
TP53 P04637 2/20 0.31
CYP3A4 P08684 2/20 0.31
MAPK1 P28482 2/20 0.31
HIF1A Q16665 2/20 0.31
NPC1 O15118 2/20 0.31
HPGD P15428 2/20 0.31
RAB9A P51151 2/20 0.31
GLA P06280 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
MMP2 P08253 1/20 0.31
MEN1 O00255 1/20 0.30
NFKB1 P19838 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anthranilic Acid SCHEMBL7728643 0.91 ALDH1A1 (0.33) ALDH1A1HSD17B10TSHRMAPTGAA
Anthranilic Acid SCHEMBL7728935 0.84 HSD17B10 (0.41) ALDH1A1HSD17B10TSHRMAPTGAA
3-Aminobenzoic Acid SCHEMBL7728790 0.82 PBRM1 (0.33)
Anthranilic Acid SCHEMBL1509357 0.75 MAPT (0.50) ALDH1A1HSD17B10TSHRMAPTGAA
Aminobenzoic Acid SCHEMBL7730847 0.75 ALDH1A1 (0.31) ALDH1A1SMN1; SMN2TP53CYP3A4MAPK1
3-Aminobenzoic Acid SCHEMBL7728795 0.74 PBRM1 (0.30)
Anthranilic Acid SCHEMBL8018582 0.72 HSD17B10 (0.32) ALDH1A1HSD17B10TSHRMAPTGAA
SCHEMBL7728930 0.72 ALDH1A1 (0.50) ALDH1A1HSD17B10TSHRMAPTGAA
SCHEMBL5708156 0.71 ALDH1A1 (0.41) ALDH1A1SMN1; SMN2TP53CYP3A4MAPK1
Phthalic Acid SCHEMBL234469 0.68 ALDH1A1 (0.52) ALDH1A1HSD17B10MAPTKDM4ESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US claimed
US-6403289-B1 ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 2002-06-11 US disclosed
US-6160081-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 2000-12-12 US disclosed
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US disclosed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US disclosed
EP-0702270-A2 Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1996-03-20 EP disclosed