Anthranilic Acid

Anthranilic Acid

SCHEMBL7728935

C=CC(=O)OC(C(=O)C=C)(C(=O)C=C)C(CO)(CO)CO.Nc1ccccc1C(=O)O

nearest known ligand 0.41

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 10/20 0.41
ALDH1A1 P00352 10/20 0.41
TSHR P16473 3/20 0.41
MAPT P10636 3/20 0.37
GAA P10253 1/20 0.35
MMP2 P08253 1/20 0.35
HPGD P15428 4/20 0.35
NPC1 O15118 3/20 0.35
RAB9A P51151 3/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
TP53 P04637 1/20 0.35
GLA P06280 1/20 0.35
CYP3A4 P08684 1/20 0.35
MAPK1 P28482 1/20 0.35
HIF1A Q16665 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
KDM4E B2RXH2 7/20 0.34
KMT2A Q03164 3/20 0.34
CFTR P13569 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7728930 0.84 ALDH1A1 (0.50) HSD17B10ALDH1A1TSHRMAPTGAA
Anthranilic Acid SCHEMBL7728640 0.84 ALDH1A1 (0.36) HSD17B10ALDH1A1TSHRMAPTGAA
Aminobenzoic Acid SCHEMBL7728346 0.81 ALDH1A1 (0.33) ALDH1A1TSHRMAPTGAAHPGD
3-Aminobenzoic Acid SCHEMBL8361933 0.81
Anthranilic Acid SCHEMBL7728643 0.80 ALDH1A1 (0.33) HSD17B10ALDH1A1TSHRMAPTGAA
3-Aminobenzoic Acid SCHEMBL7726622 0.80 PBRM1 (0.38) ALDH1A1NPC1KDM4EPOLB
SCHEMBL8361883 0.79 ALDH1A1 (0.42) HSD17B10ALDH1A1TSHRHPGDSMN1; SMN2
Adipic Acid SCHEMBL11653632 0.74 ABCC4 (0.38) ALDH1A1TSHRMAPTSMN1; SMN2TP53
Anthranilic Acid SCHEMBL28283973 0.73 THRB (0.48) HSD17B10ALDH1A1TSHRMAPTGAA
Anthranilic Acid SCHEMBL7721994 0.72 ALDH1A1 (0.38) HSD17B10ALDH1A1TSHRMAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US claimed
US-6403289-B1 ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 2002-06-11 US disclosed
US-6160081-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 2000-12-12 US disclosed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US disclosed
EP-0702270-A2 Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1996-03-20 EP disclosed