Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PBRM1 | Q86U86 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 3-Aminobenzoic Acid SCHEMBL7728790 | 0.91 | PBRM1 (0.33) | PBRM1 | |
| Aminobenzoic Acid SCHEMBL7730847 | 0.89 | ALDH1A1 (0.31) | — | |
| Anthranilic Acid SCHEMBL7728643 | 0.84 | ALDH1A1 (0.33) | — | |
| SCHEMBL5708156 | 0.82 | ALDH1A1 (0.41) | — | |
| 3-Aminobenzoic Acid SCHEMBL7726622 | 0.81 | PBRM1 (0.38) | PBRM1 | |
| Phosphoric Acid SCHEMBL28460922 | 0.80 | ALDH1A1 (0.38) | — | |
| 3-Aminobenzoic Acid SCHEMBL7728360 | 0.76 | — | — | |
| Anthranilic Acid SCHEMBL7728640 | 0.74 | ALDH1A1 (0.36) | — | |
| SCHEMBL7726613 | 0.72 | ADRB2 (0.39) | PBRM1 | |
| Isophthalic Acid SCHEMBL11490528 | 0.69 | ALDH1A1 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | claimed |
| US-6403289-B1 | ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS | NIPPON ZEON CO., LTD. (JP) | 2002-06-11 | — | — | US | disclosed |
| US-6160081-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | disclosed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | disclosed |
| EP-0702270-A2 | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |