SCHEMBL7728930

SCHEMBL7728930

C=CC(=O)OC(C(=O)C=C)(C(=O)C=C)C(CO)(CO)COC(=O)c1ccccc1N

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.50
HSD17B10 Q99714 9/20 0.50
TSHR P16473 4/20 0.50
RAB9A P51151 3/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
HPGD P15428 3/20 0.40
CYP3A4 P08684 3/20 0.40
NPC1 O15118 2/20 0.40
TP53 P04637 2/20 0.40
MAPK1 P28482 2/20 0.40
HIF1A Q16665 2/20 0.40
GLA P06280 2/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
KDM4E B2RXH2 4/20 0.40
MEN1 O00255 1/20 0.40
NFKB1 P19838 1/20 0.40
NFKB2 Q00653 1/20 0.40
KMT2A Q03164 1/20 0.40
RELA Q04206 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anthranilic Acid SCHEMBL7728935 0.84 HSD17B10 (0.41) ALDH1A1HSD17B10TSHRRAB9ASMN1; SMN2
SCHEMBL7728340 0.82 CYP3A4 (0.40) ALDH1A1TSHRRAB9ASMN1; SMN2CYP3A4
SCHEMBL7726613 0.81 ADRB2 (0.39) ALDH1A1RAB9ASMN1; SMN2CYP3A4NPC1
SCHEMBL7721993 0.74 ALDH1A1 (0.47) ALDH1A1HSD17B10TSHRRAB9ASMN1; SMN2
SCHEMBL7721922 0.74 ALDH1A1 (0.31) ALDH1A1SMN1; SMN2CYP3A4TP53MAPK1
SCHEMBL8361883 0.73 ALDH1A1 (0.42) ALDH1A1HSD17B10TSHRSMN1; SMN2HPGD
SCHEMBL14030807 0.72 ALDH1A1 (0.60) ALDH1A1HSD17B10TSHRRAB9ASMN1; SMN2
SCHEMBL14029379 0.72 ALDH1A1 (0.60) ALDH1A1HSD17B10TSHRRAB9ASMN1; SMN2
SCHEMBL14029372 0.72 ALDH1A1 (0.60) ALDH1A1HSD17B10TSHRRAB9ASMN1; SMN2
Anthranilic Acid SCHEMBL7728640 0.72 ALDH1A1 (0.36) ALDH1A1HSD17B10TSHRRAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US claimed
US-6403289-B1 ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 2002-06-11 US disclosed
US-6160081-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 2000-12-12 US disclosed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US disclosed
EP-0702270-A2 Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1996-03-20 EP disclosed