⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 3-Aminobenzoic Acid SCHEMBL7728353 | 0.92 | PBRM1 (0.32) | — | |
| Aminobenzoic Acid SCHEMBL7721641 | 0.89 | POLB (0.32) | — | |
| Anthranilic Acid SCHEMBL8018584 | 0.84 | — | — | |
| 3-Aminobenzoic Acid SCHEMBL7728826 | 0.81 | PBRM1 (0.38) | — | |
| Aminobenzoic Acid SCHEMBL7721636 | 0.80 | POLB (0.35) | — | |
| 3-Aminobenzoic Acid SCHEMBL7728795 | 0.76 | PBRM1 (0.30) | — | |
| Anthranilic Acid SCHEMBL8018582 | 0.75 | HSD17B10 (0.32) | — | |
| SCHEMBL7728821 | 0.73 | ADRB2 (0.41) | — | |
| Aminobenzoic Acid SCHEMBL6802563 | 0.69 | HTT (0.40) | — | |
| 3-Aminobenzoic Acid SCHEMBL8361933 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | claimed |
| US-6403289-B1 | ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS | NIPPON ZEON CO., LTD. (JP) | 2002-06-11 | — | — | US | disclosed |
| US-6160081-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | disclosed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | disclosed |
| EP-0702270-A2 | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |