SCHEMBL7741124

SCHEMBL7741124

O=C1c2ccccc2C(=O)c2ccc(Cl)c3cccc1c23

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYMS P04818 1/20 0.67
CYP1A2 P05177 5/20 0.61
KDM4E B2RXH2 4/20 0.61
ALDH1A1 P00352 4/20 0.61
MAPT P10636 2/20 0.61
POLB P06746 1/20 0.61
ERCC1 P07992 1/20 0.61
TSHR P16473 1/20 0.61
ALOX12 P18054 1/20 0.61
FEN1 P39748 1/20 0.61
ERCC4 Q92889 1/20 0.61
TDP1 Q9NUW8 1/20 0.61
HPGD P15428 1/20 0.61
PABPC1 P11940 2/20 0.58
SMN1; SMN2 Q16637 1/20 0.58
LMNA P02545 1/20 0.56
KMT2A Q03164 3/20 0.50
DNMT1 P26358 2/20 0.48
CYP3A4 P08684 2/20 0.48
CASP1 P29466 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3437810 0.92 TYMS (0.71) TYMSCYP1A2KDM4EALDH1A1MAPT
SCHEMBL10490163 0.83 TYMS (0.64) TYMSCYP1A2KDM4EALDH1A1MAPT
SCHEMBL31266544 0.83 TYMS (0.64) TYMSCYP1A2KDM4EALDH1A1MAPT
SCHEMBL29478287 0.80 TYMS (1.00) TYMSCYP1A2KDM4EALDH1A1MAPT
SCHEMBL29486055 0.80 TYMS (1.00) TYMSCYP1A2KDM4EALDH1A1MAPT
SCHEMBL212889 0.80 TYMS (1.00) TYMSCYP1A2KDM4EALDH1A1MAPT
SCHEMBL11768082 0.79 KDM4E (0.70) TYMSCYP1A2KDM4EALDH1A1MAPT
SCHEMBL29456701 0.79 PABPC1 (0.72) CYP1A2KDM4EALDH1A1MAPTPOLB
SCHEMBL13045522 0.79 PABPC1 (0.72) CYP1A2KDM4EALDH1A1MAPTPOLB
SCHEMBL8892867 0.78 TYMS (0.65) TYMSCYP1A2KDM4EALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6180320-B1 Method of manufacturing a semiconductor device having a fine pattern, and semiconductor device manufactured thereby MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2001-01-30 US disclosed
EP-0179921-B1 BASE MATERIAL HAVING A DYED SURFACE FILM AND DYEING METHOD NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1990-08-08 EP disclosed
US-4675252-A Base material having a dyed membrane on the surface thereof, and method for dyeing a membrane thereon NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1987-06-23 US disclosed
EP-0179921-A1 BASE MATERIAL HAVING A DYED SURFACE FILM AND DYEING METHOD NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1986-05-07 EP disclosed
US-4264713-A COMPRISING LIGHT SENSITIVE POLYMERS OF AN UNSATURATED POLYESTER AND AN ACRYLIC POLYMER WITH UNSATURATED SIDE CHAINS FUJI PHOTO FILM CO., LTD. (JP) 1981-04-28 US disclosed
US-4205988-A Photochromic method involving an aromatic amine ASAHI KASEI K. K. (JP) 1980-06-03 US disclosed