SCHEMBL7741675

SCHEMBL7741675

O=C(O)C1C2CC3CC(C2)C1C3

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
HSD11B1 P28845 2/20 0.37
GRM2 Q14416 5/20 0.31
GRM5 P41594 4/20 0.31
GRM4 Q14833 3/20 0.31
GRM6 O15303 2/20 0.31
GRM1 Q13255 2/20 0.31
GRM3 Q14832 2/20 0.31
P2RX7 Q99572 1/20 0.31
PKM P14618 1/20 0.31
APEX1 P27695 1/20 0.31
KDM4E B2RXH2 1/20 0.31
GMNN O75496 1/20 0.31
LMNA P02545 1/20 0.31
PMP22 Q01453 1/20 0.31
TFPI2 P48307 1/20 0.31
TP53 P04637 1/20 0.31
TSHR P16473 1/20 0.31
NFKB1 P19838 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14118138 0.93 POLB (0.39) POLBTDP1HSD11B1GRM2GRM5
SCHEMBL7258876 0.85 CYP2C9 (0.42) POLBTDP1HSD11B1GRM2GRM4
SCHEMBL11345653 0.83 GABRR1 (0.33) POLBTDP1HSD11B1GRM2GRM5
SCHEMBL16698251 0.79 HSD11B1 (0.48) POLBTDP1HSD11B1GRM2GRM5
SCHEMBL160953 0.79 HSD11B1 (0.48) POLBTDP1HSD11B1GRM2GRM5
SCHEMBL19859959 0.79 HSD11B1 (0.48) POLBTDP1HSD11B1GRM2GRM5
SCHEMBL5678601 0.79 HSD11B1 (0.35) HSD11B1P2RX7CYP2C9CYP2C19
SCHEMBL31349739 0.77 HSD11B1 (0.46) POLBTDP1HSD11B1GRM2GRM5
Hydrochloric Acid SCHEMBL3051989 0.77 HSD11B1 (0.46) POLBTDP1HSD11B1GRM2GRM5
SCHEMBL28134787 0.77 HSD11B1 (0.46) POLBTDP1HSD11B1GRM2GRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6238842-B1 SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS FUJI PHOTO FILM CO., LTD. (JP) 2001-05-29 US disclosed