Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAAR1 | Q96RJ0 | 7/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.38 |
| ▸ | KIF11 | P52732 | 2/20 | 0.35 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.35 |
| ▸ | HTR2A | P28223 | 2/20 | 0.34 |
| ▸ | MPO | P05164 | 1/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.34 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.33 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13714249 | 0.82 | LIPG (0.44) | TLR8 | |
| SCHEMBL4346247 | 0.80 | FOLH1 (0.32) | — | |
| SCHEMBL4533827 | 0.80 | TAAR1 (0.41) | TAAR1MAOAKIF11HTR2AMPO | |
| SCHEMBL1931186 | 0.79 | TAAR1 (0.42) | TAAR1MAOAKIF11TLR8HTR2A | |
| SCHEMBL4810563 | 0.79 | PNMT (0.44) | TAAR1SLC6A4CYP2A6 | |
| SCHEMBL4201232 | 0.78 | LIPG (0.34) | — | |
| SCHEMBL3678681 | 0.78 | TAAR1 (0.50) | TAAR1MAOAKIF11HTR2AMPO | |
| SCHEMBL29943451 | 0.78 | TAAR1 (0.50) | TAAR1MAOAKIF11HTR2AMPO | |
| SCHEMBL1069351 | 0.77 | TAAR1 (0.36) | TAAR1MAOAKIF11TLR8HTR2A | |
| SCHEMBL1929389 | 0.74 | MAOA (0.41) | TAAR1MAOAKIF11TLR8MPO |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0929841-A4 | METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT | MKE QUANTUM COMPONENTS COLORAD (US) | 2001-04-18 | — | — | EP | claimed |
| US-5955244-A | Method for forming photoresist features having reentrant profiles using a basic agent | QUANTUM CORPORATION (US) | 1999-09-21 | — | — | US | claimed |
| EP-0929841-A1 | METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT | Mke-Quantum Components Colorado LLC (US) | 1999-07-21 | — | — | EP | claimed |
| WO-1998008143-A1 | METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT | MKE-QUANTUM COMPONENTS COLORADO LLC (US) | 1998-02-26 | — | — | WO | claimed |
| CN-102558859-B | Polyimide film made of multicomponent polyimide and process of producing the same | UBE INDUSTRIES | 2014-12-03 | — | — | CN | disclosed |
| CN-102375336-B | Manufacturing method of photosensitive resin composition and solidified embossing pattern, and semiconductor device | ASAHI KASEI E MATERIALS CORP | 2013-10-09 | — | — | CN | disclosed |
| CN-103328543-A | Modified silicone compound, and thermosetting resin composition, prepreg, laminate plate and printed wiring board using same | HITACHI CHEMICAL CO LTD | 2013-09-25 | — | — | CN | disclosed |
| CN-102162996-B | Manufacture method for negative type photosensitive resin composition and cured relief pattern | ASAHI KASEI E MATERIALS CORP | 2013-07-17 | — | — | CN | disclosed |
| CN-102558859-A | Polyimide film made of multicomponent polyimide and process of producing the same | UBE INDUSTRIES | 2012-07-11 | — | — | CN | disclosed |
| CN-101646960-B | Optical member, optical system using the same, and method for manufacturing optical member | CANON KK | 2012-07-04 | — | — | CN | disclosed |
| CN-101809064-B | Polyamide resin, photosensitive resin composition, method for forming cured relief pattern, and semiconductor device | ASAHI KASEI E MATERIALS CORP | 2012-06-13 | — | — | CN | disclosed |
| CN-101370892-B | Polyimide resin composition and metal polyimide laminate | ASAHI KASEI E MATERIALS CORP | 2012-06-13 | — | — | CN | disclosed |
| CN-1805949-A | Bis (fluorine-containing phthalic anhydride) and method for production thereof | NIPPON CATALYTIC CHEM IND (JP) | 2006-07-19 | — | — | CN | disclosed |
| CN-1668980-A | Highly heat-resistant, negative-type photosensitive resin composition | ASAHI CHEMICAL CORP (JP) | 2005-09-14 | — | — | CN | disclosed |
| CN-1128384-C | Liquid crystal aligning agent | SUMITOMO BAKELITE CO (JP) | 2003-11-19 | — | — | CN | disclosed |
| EP-0929841-A4 | METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT | MKE QUANTUM COMPONENTS COLORAD (US) | 2001-04-18 | — | — | EP | disclosed |
| CN-1257587-A | Aligning agent for liquid crystal | SUMITOMO BAKELITE CO (JP) | 2000-06-21 | — | — | CN | disclosed |
| US-5955244-A | Method for forming photoresist features having reentrant profiles using a basic agent | QUANTUM CORPORATION (US) | 1999-09-21 | — | — | US | disclosed |
| EP-0929841-A1 | METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT | Mke-Quantum Components Colorado LLC (US) | 1999-07-21 | — | — | EP | disclosed |
| WO-1998008143-A1 | METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT | MKE-QUANTUM COMPONENTS COLORADO LLC (US) | 1998-02-26 | — | — | WO | disclosed |