SCHEMBL7745983

SCHEMBL7745983

O=C(O)C1=CC(Cl)c2ccccc2C1=O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EDNRB P24530 5/20 0.46
EDNRA P25101 5/20 0.46
MAPT P10636 3/20 0.39
ALDH1A1 P00352 2/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
LMNA P02545 1/20 0.39
KMT2A Q03164 2/20 0.37
TTR P02766 2/20 0.36
CYP1A2 P05177 1/20 0.36
TSHR P16473 1/20 0.36
NPC1 O15118 1/20 0.36
HK1 P19367 1/20 0.36
MAPK1 P28482 1/20 0.36
CDC25A P30304 1/20 0.36
CDC25B P30305 1/20 0.36
CDC25C P30307 1/20 0.36
HTT P42858 1/20 0.36
RAB9A P51151 1/20 0.36
HKDC1 Q2TB90 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7912897 0.85 EDNRB (0.41) EDNRBEDNRAMAPTALDH1A1L3MBTL1
SCHEMBL7918989 0.70 S100A4 (0.41) EDNRBEDNRAMAPTLMNAKMT2A
SCHEMBL21999688 0.68 MAPT (0.49) EDNRBEDNRAMAPTALDH1A1LMNA
SCHEMBL27952806 0.67 KMT2A (0.36) EDNRBEDNRAMAPTALDH1A1KMT2A
SCHEMBL6904734 0.66 MEN1 (0.52) EDNRBEDNRAMAPTLMNAKMT2A
SCHEMBL6906665 0.66 EDNRB (0.66) EDNRBEDNRAMAPTALDH1A1L3MBTL1
SCHEMBL9296680 0.66 KMT2A (0.40) EDNRBEDNRAMAPTALDH1A1L3MBTL1
SCHEMBL31316342 0.66 EDNRB (0.39) EDNRBEDNRAMAPTALDH1A1L3MBTL1
SCHEMBL31316341 0.66 EDNRB (0.39) EDNRBEDNRAMAPTALDH1A1L3MBTL1
SCHEMBL1243588 0.64 BACE1 (0.52) MAPTALDH1A1L3MBTL1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6238842-B1 SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS FUJI PHOTO FILM CO., LTD. (JP) 2001-05-29 US disclosed