SCHEMBL7746571

SCHEMBL7746571

C=C(C)C(=O)NC(=O)OCCN(CC)CC

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.39
CYP2D6 P10635 3/20 0.39
TSHR P16473 3/20 0.39
CYP1A2 P05177 2/20 0.39
MAOA P21397 1/20 0.39
HTR3A P46098 1/20 0.39
HRH3 Q9Y5N1 1/20 0.39
CYP3A4 P08684 2/20 0.38
ALDH1A1 P00352 2/20 0.38
BLM P54132 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
CHRM2 P08172 4/20 0.37
CHRM1 P11229 3/20 0.37
CHRM3 P20309 3/20 0.37
SCN1A P35498 3/20 0.37
SCN2A Q99250 3/20 0.37
SCN3A Q9NY46 3/20 0.37
CHRM4 P08173 2/20 0.37
CHRM5 P08912 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1573807 0.83 CHRM1 (0.46) LMNACYP1A2MAOAHRH3CYP3A4
SCHEMBL2930085 0.80 TSHR (0.40) TSHRALDH1A1SMN1; SMN2L3MBTL1
SCHEMBL2930891 0.77 TSHR (0.50) LMNATSHRALDH1A1
SCHEMBL28273630 0.77 THRB (0.55) LMNACYP2D6TSHRCYP1A2MAOA
SCHEMBL14874 0.77 THRB (0.55) LMNACYP2D6TSHRCYP1A2MAOA
SCHEMBL357937 0.76 ALDH1A1 (0.49) LMNATSHRALDH1A1MEN1POLB
Hydrochloric Acid SCHEMBL2847352 0.75 THRB (0.53) LMNACYP2D6TSHRCYP1A2MAOA
SCHEMBL22684899 0.75 THRB (0.53) LMNACYP2D6TSHRCYP1A2MAOA
SCHEMBL9800939 0.75 THRB (0.53) LMNACYP2D6TSHRCYP1A2MAOA
SCHEMBL9300760 0.75 ALDH1A1 (0.37) TSHRALDH1A1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5731128-A ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY NIPPON PAINT CO., LTD. (JP) 1998-03-24 US claimed
EP-0718695-B1 Water-developable photosensitive resin composition NIPPON PAINT CO LTD (JP) 2001-09-19 EP disclosed
EP-0675412-B1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 2001-01-17 EP disclosed
US-5861232-A FLEXOGRAPHIC PLATE NIPPON PAINT CO., LTD. (JP) 1999-01-19 US disclosed
EP-0745900-B1 Water-developing photosensitive resin composition NIPPON PAINT CO LTD (JP) 1998-12-30 EP disclosed
US-5837421-A POLYMERS FOR FLEXOGRAPHIC PRINTING PLATES MADE FROM DIENE MONOMERS AND ACRYLATE MONOMERS FOR IMPACT STRENGTH NIPPON PAINT CO., LTD. (JP) 1998-11-17 US disclosed
EP-0859284-A1 Water-developable photosensitive composition and production process thereof Nippon Paint Co., Ltd. (JP) 1998-08-19 EP disclosed
US-5736298-A COMPRISES A PARTICULATE POLYMER OF A CARBOXY-GROUP-CONTAINING-DIENE HAVING A CROSSLINKED STRUCTURE JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-04-07 US disclosed
US-5731128-A ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY NIPPON PAINT CO., LTD. (JP) 1998-03-24 US disclosed
US-5731129-A Photosensitive resin composition comprising a carboxyl group-containing diene copolymer and a hydrogenated diene block polymer JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-03-24 US disclosed
EP-0745900-A1 Water-developing photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-12-04 EP disclosed
EP-0607962-B1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-07-17 EP disclosed
EP-0718695-A2 Water-developable photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-06-26 EP disclosed
EP-0675412-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-10-04 EP disclosed