SCHEMBL775154

SCHEMBL775154

C=CC(=O)OCC(=O)N1C(=O)CC1C(C)=O

nearest known ligand 0.34

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
F2 P00734 1/20 0.34
TSHR P16473 6/20 0.33
HPGD P15428 1/20 0.33
ALDH1A1 P00352 3/20 0.32
TP53 P04637 2/20 0.32
HIF1A Q16665 2/20 0.32
CYP3A4 P08684 1/20 0.32
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775031 0.83 F2 (0.35) F2TSHRHPGDALDH1A1TP53
SCHEMBL775151 0.81 ALDH1A1 (0.37) F2TSHRALDH1A1
SCHEMBL774864 0.80 TSHR (0.33) F2TSHRHPGDALDH1A1TP53
SCHEMBL9916010 0.79 TSHR (0.33) TSHRHPGD
SCHEMBL12764303 0.75 GSK3B (0.36) ALDH1A1
SCHEMBL15461941 0.73 RIPK1 (0.34) ALDH1A1
SCHEMBL775403 0.73 TSHR (0.33) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL775283 0.73 F2 (0.32) F2TSHR
SCHEMBL775156 0.71 CYP2D6 (0.31) F2
SCHEMBL774836 0.69 HTT (0.34) F2TSHRALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed