Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.51 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.49 |
| ▸ | CASP6 | P55212 | 1/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL774834 | 0.95 | LMNA (0.49) | LMNATDP1POLBL3MBTL1CASP6 | |
| SCHEMBL775138 | 0.94 | LMNA (0.47) | LMNATDP1POLBL3MBTL1CASP6 | |
| SCHEMBL775271 | 0.90 | TDP1 (0.41) | LMNATDP1POLBL3MBTL1CASP6 | |
| SCHEMBL19754014 | 0.81 | TDP1 (0.52) | LMNATDP1POLBL3MBTL1CASP6 | |
| SCHEMBL775129 | 0.77 | LMNA (0.53) | LMNATDP1POLBL3MBTL1CASP6 | |
| SCHEMBL13130092 | 0.75 | LMNA (0.63) | LMNATDP1POLBL3MBTL1CASP6 | |
| SCHEMBL7629454 | 0.74 | TSHR (0.46) | LMNAPOLBKMT2AALDH1A1BLM | |
| SCHEMBL27677614 | 0.73 | LMNA (0.43) | LMNATDP1POLBL3MBTL1CASP6 | |
| SCHEMBL775270 | 0.73 | LMNA (0.47) | LMNATDP1POLBL3MBTL1CASP6 | |
| SCHEMBL346131 | 0.72 | LMNA (0.53) | LMNATDP1POLBL3MBTL1CASP6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120070778-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120070778-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-22 | — | — | US | disclosed |