SCHEMBL775129

SCHEMBL775129

C=C(C)C(=O)OCC(=O)N1CCCC1=O

nearest known ligand 0.53

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.53
TDP1 Q9NUW8 2/20 0.51
L3MBTL1 Q9Y468 2/20 0.51
CASP6 P55212 1/20 0.51
POLB P06746 1/20 0.50
RAB9A P51151 2/20 0.48
KMT2A Q03164 2/20 0.44
BLM P54132 2/20 0.39
ALDH1A1 P00352 1/20 0.39
GAA P10253 1/20 0.39
KDM4E B2RXH2 1/20 0.38
MEN1 O00255 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38
MAPT P10636 1/20 0.38
THRB P10828 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
RECQL P46063 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775270 0.95 LMNA (0.47) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL775136 0.94 TDP1 (0.46) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL774982 0.91 TDP1 (0.41) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL13130092 0.77 LMNA (0.63) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL775394 0.77 LMNA (0.54) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL4906332 0.75 TSHR (0.45) LMNAKMT2AALDH1A1CYP1A2CYP2D6
SCHEMBL774997 0.74 ALDH1A1 (0.38) L3MBTL1KMT2AALDH1A1MEN1CYP2D6
SCHEMBL19754014 0.74 TDP1 (0.52) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL775146 0.73 ALDH1A1 (0.37) KMT2AALDH1A1CYP2D6CYP2C19
SCHEMBL774846 0.73 ALDH1A1 (0.37) L3MBTL1KMT2AALDH1A1MEN1CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed