SCHEMBL775270

SCHEMBL775270

C=C(C)C(=O)OCC(=O)N1CCCCC1=O

nearest known ligand 0.47

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.47
TDP1 Q9NUW8 2/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
CASP6 P55212 1/20 0.47
POLB P06746 1/20 0.46
RAB9A P51151 2/20 0.44
KMT2A Q03164 1/20 0.41
ALDH1A1 P00352 1/20 0.36
GAA P10253 1/20 0.36
BLM P54132 1/20 0.36
MITF O75030 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775136 0.99 TDP1 (0.46) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL775129 0.95 LMNA (0.53) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL774982 0.89 TDP1 (0.41) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL774834 0.78 LMNA (0.49) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL775138 0.77 LMNA (0.47) LMNATDP1L3MBTL1CASP6POLB
SCHEMBL20649345 0.76 LMNA (0.35) LMNATDP1L3MBTL1CASP6KMT2A
SCHEMBL774846 0.75 ALDH1A1 (0.37) L3MBTL1KMT2AALDH1A1
SCHEMBL12656022 0.75 KMT2A (0.42) L3MBTL1KMT2AALDH1A1GAABLM
SCHEMBL775145 0.74 ALDH1A1 (0.36) KMT2AALDH1A1
SCHEMBL8067929 0.74 LMNA (0.46) LMNATDP1L3MBTL1CASP6KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed