SCHEMBL7757793

SCHEMBL7757793

C[SiH](C)OC(CN(CC(O[SiH](C)C)C(C)(C)C)S(=O)(=O)c1ccc([Bi](c2ccc(S(=O)(=O)N(CC(O[SiH](C)C)C(C)(C)C)CC(O[SiH](C)C)C(C)(C)C)cc2S(=O)(=O)N(CC(O[SiH](C)C)C(C)(C)C)CC(O[SiH](C)C)C(C)(C)C)c2ccc(S(=O)(=O)N(CC(O[SiH](C)C)C(C)(C)C)CC(O[SiH](C)C)C(C)(C)C)cc2S(=O)(=O)N(CC(O[SiH](C)C)C(C)(C)C)CC(O[SiH](C)C)C(C)(C)C)c(S(=O)(=O)N(CC(O[SiH](C)C)C(C)(C)C)CC(O[SiH](C)C)C(C)(C)C)c1)C(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TAS2R14 Q9NYV8 1/20 0.33
POLB P06746 1/20 0.30
ALDH1A1 P00352 2/20 0.30
SPPL2A Q8TCT8 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8571750 0.84 TAS2R14 (0.34) TAS2R14POLBALDH1A1SPPL2AMAPT
SCHEMBL7758285 0.68 SMN1; SMN2 (0.53) POLBALDH1A1MAPT
SCHEMBL7757769 0.68 VCAM1 (0.36) POLBALDH1A1MAPT
SCHEMBL1533710 0.58 CYP24A1 (0.39) ALDH1A1
SCHEMBL7969044 0.57 POLB (0.37) POLBALDH1A1
SCHEMBL1748646 0.55
SCHEMBL4188563 0.55 KDM4E (0.32) ALDH1A1
SCHEMBL11137915 0.54 POLB (0.56) POLBALDH1A1MAPT
SCHEMBL11151096 0.54 ALDH1A1 (0.67) ALDH1A1MAPT
SCHEMBL7759472 0.54 HTT (0.49) POLBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5730953-A RADIOGRAPHIC CONTRAST MEDIUM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 1998-03-24 US claimed
EP-0716091-B1 TRIS(SUBSTITUTED PHENYL)BISMUTH DERIVATIVE NISSAN CHEMICAL IND LTD (JP) 2001-03-21 EP disclosed
US-5730953-A RADIOGRAPHIC CONTRAST MEDIUM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 1998-03-24 US disclosed
EP-0716091-A1 TRIS(SUBSTITUTED PHENYL)BISMUTH DERIVATIVE NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) 1996-06-12 EP disclosed